SCHEMBL17022739

SCHEMBL17022739

CC(C)(O)c1cc(CC(=O)Cc2cc(C(C)(C)O)cc(C(C)(C)O)c2)cc(C(C)(C)O)c1

nearest known ligand 0.37

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
▸ RXRA P19793 4/20 0.37
▸ RXRB P28702 4/20 0.37
▸ RXRG P48443 3/20 0.37
▸ CYP1A2 P05177 1/20 0.35
▸ CYP2C19 P33261 1/20 0.35
▸ TACR1 P25103 3/20 0.33
▸ HSP90AB1 P08238 1/20 0.31
▸ CCR9 P51686 1/20 0.31
▸ GABRA1 P14867 1/20 0.30
▸ GABRB2 P47870 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18802726 0.90 CYP1A2 (0.36) RXRARXRBRXRGCYP1A2CYP2C19
SCHEMBL2005900 0.84 RXRB (0.50) RXRARXRBRXRGCYP1A2CYP2C19
SCHEMBL17022737 0.80 CYP1A2 (0.53) CYP1A2CYP2C19
SCHEMBL17022740 0.79 RXRA (0.40) RXRARXRBRXRGCYP1A2CYP2C19
SCHEMBL17022729 0.78 RXRA (0.41) RXRARXRBRXRGCCR9
SCHEMBL547556 0.77 GABRA1 (0.35) GABRA1GABRB2
SCHEMBL6865708 0.76 CES2 (0.52) RXRARXRBRXRGTACR1
SCHEMBL548187 0.75 GABRA1 (0.45) RXRARXRBRXRGCYP1A2GABRA1
SCHEMBL17022730 0.75 ACE2 (0.31) —
SCHEMBL21699102 0.75 RXRA (0.54) RXRARXRBRXRGCYP1A2CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2911002-B1 RESIST COMPOSITION MITSUBISHI GAS CHEMICAL CO (JP) 2019-07-17 — — EP disclosed
US-20180074404-A1 RADIATION-SENSITIVE COMPOSITION AND METHOD FOR FORMING RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-03-15 — — US disclosed
EP-3279731-A1 RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD Mitsubishi Gas Chemical Company, Inc. (JP) 2018-02-07 — — EP disclosed
US-9354516-B2 Resist composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2016-05-31 — — US disclosed
US-20150286136-A1 RESIST COMPOSITION MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2015-10-08 — — US disclosed
EP-2911002-A1 RESIST COMPOSITION Mitsubishi Gas Chemical Company, Inc. (JP) 2015-08-26 — — EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150286136-A1 RESIST COMPOSITION SLC11A2, CROCC, PARG RXRA 1496/4885RXRB 1773/4885RXRG 1122/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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