SCHEMBL17070159

SCHEMBL17070159

COC(=O)C1(C)C2CCC(C2)C1(F)F

nearest known ligand 0.33

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
HTT P42858 1/20 0.33
CHRNB2 P17787 4/20 0.31
CHRNB4 P30926 4/20 0.31
CHRNA3 P32297 4/20 0.31
CHRNA7 P36544 4/20 0.31
CHRNA4 P43681 4/20 0.31
CHRNA1 P02708 3/20 0.31
CHRNG P07510 3/20 0.31
CHRNB1 P11230 3/20 0.31
CHRND Q07001 3/20 0.31
LMNA P02545 1/20 0.31
CYP3A4 P08684 1/20 0.31
PKM P14618 1/20 0.31
NFKB1 P19838 1/20 0.31
CYP2C19 P33261 1/20 0.31
THPO P40225 1/20 0.31
CHRNE Q04844 1/20 0.31
CHRNA2 Q15822 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9908363 0.79
SCHEMBL9908362 0.74
SCHEMBL9908328 0.66 HSD11B1 (0.33) HTT
SCHEMBL14999006 0.65 HTT (0.40) HTTNPSR1
SCHEMBL27937138 0.64 HTT (0.41) HTTCYP3A4NPSR1
SCHEMBL27937137 0.64 HTT (0.41) HTTCYP3A4NPSR1
SCHEMBL15114408 0.64 NPSR1 (0.41) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL14423156 0.64 CHRNB2 (0.33) CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4
SCHEMBL3669479 0.63 NPSR1 (0.39) LMNACYP3A4PKMCYP2C19THPO
SCHEMBL4740020 0.63 ALDH1A1 (0.33) HTTCYP3A4NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9448482-B2 Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device FUJIFILM CORPORATION (JP) 2016-09-20 US disclosed
US-20150253673-A1 PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-09-10 US disclosed