SCHEMBL17070964

SCHEMBL17070964

CCC(C)(C)C(=O)Oc1cc(C)oc(=O)c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 10/20 0.48
KDM4E B2RXH2 9/20 0.48
MAPT P10636 4/20 0.48
POLB P06746 1/20 0.48
GLA P06280 6/20 0.40
KMT2A Q03164 4/20 0.40
MEN1 O00255 1/20 0.40
CYP3A4 P08684 1/20 0.40
CA1 P00915 1/20 0.38
CA9 Q16790 1/20 0.38
BRD4 O60885 1/20 0.37
ELANE P08246 1/20 0.37
GAA P10253 5/20 0.36
HSD17B10 Q99714 3/20 0.36
CASP1 P29466 2/20 0.36
CASP7 P55210 2/20 0.36
LMNA P02545 2/20 0.36
MAPK1 P28482 2/20 0.36
TP53 P04637 1/20 0.36
HTT P42858 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14747378 0.77 ELANE (0.42) ALDH1A1KDM4EMAPTKMT2AMEN1
SCHEMBL12736994 0.76 ELANE (0.41) POLBELANELMNAHTTRIPK1
SCHEMBL9901826 0.75 KDM4E (0.54) ALDH1A1KDM4EMAPTPOLBGLA
SCHEMBL15043140 0.75 ELANE (0.44) MAPTKMT2AMEN1CYP3A4CA1
SCHEMBL9902245 0.75 ALDH1A1 (0.58) ALDH1A1KDM4EMAPTPOLBGLA
SCHEMBL26453057 0.74 ELANE (0.41) KMT2AMEN1ELANERIPK1
SCHEMBL8738351 0.74 ESR1 (0.44) ALDH1A1POLBKMT2AMEN1CYP3A4
SCHEMBL14680976 0.74 ALDH1A1 (0.67) ALDH1A1KDM4EMAPTGLAKMT2A
SCHEMBL11929858 0.74 ALDH1A1 (0.49) ALDH1A1KDM4EMAPTPOLBGLA
SCHEMBL17548965 0.73 CA2 (0.50) ALDH1A1MAPTPOLBCA1ELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9250522-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-02-02 US disclosed
US-20150253665-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-09-10 US disclosed