SCHEMBL1712973

SCHEMBL1712973

COc1c[c]c[c]c1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL63193 0.75 ALDH1A1 (0.59)
SCHEMBL28108949 0.73 ALDH1A1 (0.56)
SCHEMBL28321856 0.73 ALDH1A1 (0.56)
SCHEMBL28089288 0.73 ALDH1A1 (0.56)
SCHEMBL28007784 0.73 ALDH1A1 (0.56)
SCHEMBL4734076 0.70 RELA (0.59)
SCHEMBL9254 0.67
SCHEMBL161853 0.67
SCHEMBL2699 0.67
SCHEMBL27957637 0.67 ALDH1A1 (0.48)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 140 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0826740-B1 Symmetrical perylene dimers XEROX CORP (US) 2002-10-16 EP claimed
EP-0826740-A1 Symmetrical perylene dimers XEROX CORPORATION (US) 1998-03-04 EP claimed
US-5645965-A XEROGRAPHY, CHARGE GENERATING COMPOUNDS XEROX CORPORATION (US) 1997-07-08 US claimed
EP-0351194-B1 Thiazole derivatives having a 5-lipoxygenase-inhibiting activity ICI PLC (GB) 1994-06-15 EP claimed
US-5196422-A Antiinflammatory agents, antiallergens ICI PHARMA (FR) 1993-03-23 US claimed
US-5089513-A Antiinflammatory agents; antiallergens; asthma; side effect reduction ICI PHARMA (FR) 1992-02-18 US claimed
EP-0351194-A2 Thiazole derivatives having a 5-lipoxygenase-inhibiting activity IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1990-01-17 EP claimed
EP-4342931-A1 ACID DIANHYDRIDE MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-03-27 EP disclosed
US-20240092975-A1 BISIMIDE PHENOL COMPOUND MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-03-21 US disclosed
EP-4321516-A1 BISIMIDE PHENOL COMPOUND MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2024-02-14 EP disclosed
US-11874563-B2 Photoaligning polymer materials Rolic Technologies AG (CH) 2024-01-16 US disclosed
CN-117337314-A Acid dianhydride 三菱瓦斯化学株式会社 2024-01-02 CN disclosed
CN-113412251-B Methods and compositions for preparing photoaligned polymeric materials 罗利克技术有限公司 2023-11-28 CN disclosed
US-4417058-A PHOTOCROSSLINKING POLYMERS AS PHOTORESISTS CIBA-GEIGY CORPORATION (US) 1983-11-22 US disclosed
US-4414394-A PHOTOCROSSLINKABLE POLYMERS FOR OFFSET PRINTING PLATES AND PHOTORESISTS CIBA-GEIGY CORPORATION (US) 1983-11-08 US disclosed
US-4377668-A PHOTORESISTS CIBA-GEIGY CORPORATION (US) 1983-03-22 US disclosed
US-4377669-A PHOTORESISTS CIBA-GEIGY CORPORATION (US) 1983-03-22 US disclosed
US-4337200-A INTERMEDIATES FOR PHOTORESISTS CIBA-GEIGY CORPORATION (US) 1982-06-29 US disclosed
US-4283509-A ADDITION POLYMERS CIBA-GEIGY CORPORATION (US) 1981-08-11 US disclosed
US-4242264-A MONOMERS FOR PHOTOCROSSLINKABLE POLYMERS CIBA-GEIGY CORPORATION (US) 1980-12-30 US disclosed