SCHEMBL17130619

SCHEMBL17130619

O=c1c2ccccc2c2ccccc2c(=O)n1OS(=O)(=O)C1CCCCC1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.39
LMNA P02545 4/20 0.39
HPGD P15428 3/20 0.39
MAPT P10636 1/20 0.39
HIF1A Q16665 1/20 0.39
BRD4 O60885 2/20 0.39
TSHR P16473 3/20 0.38
KDM4E B2RXH2 2/20 0.38
HTT P42858 3/20 0.37
MEN1 O00255 1/20 0.37
CYP1A2 P05177 1/20 0.37
CYP3A4 P08684 1/20 0.37
CYP2D6 P10635 1/20 0.37
CYP2C9 P11712 1/20 0.37
KMT2A Q03164 1/20 0.37
HTR6 P50406 1/20 0.36
SMN1; SMN2 Q16637 3/20 0.36
ALPL P05186 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
GAA P10253 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4835568 0.87 CA12 (0.33) ALDH1A1LMNAHPGDMAPTHIF1A
SCHEMBL11026158 0.74 ALDH1A1 (0.50) ALDH1A1LMNAHPGDMAPTKDM4E
SCHEMBL17130613 0.72 MAPK1 (0.41) ALDH1A1LMNAMAPTTSHRKDM4E
SCHEMBL17130614 0.68 MAPK1 (0.41) ALDH1A1LMNAMAPTBRD4TSHR
SCHEMBL4836768 0.67 ALDH1A1 (0.32) ALDH1A1CYP3A4CYP2C9KMT2ASMN1; SMN2
SCHEMBL1607280 0.67 PARL (0.42) SMN1; SMN2L3MBTL1
SCHEMBL8398048 0.67 ENPP1 (0.50) ALDH1A1KDM4EMEN1KMT2ASMN1; SMN2
SCHEMBL17130616 0.66 KMT2A (0.47) ALDH1A1LMNAHPGDMAPTTSHR
SCHEMBL8398080 0.65 ENPP1 (0.48) ALDH1A1LMNAMEN1KMT2ASMN1; SMN2
SCHEMBL17130620 0.65 VDR (0.58) ALDH1A1LMNAHPGDMAPTKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2015146053-A1 IMIDE SULFONATE COMPOUND, PHOTOACID GENERATOR, AND RESIN COMPOSITION FOR PHOTOLITHOGRAPHY サンアプロ株式会社 2015-10-01 WO disclosed