Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 3/20 | 0.50 |
| ▸ | CA12 | O43570 | 2/20 | 0.50 |
| ▸ | CA3 | P07451 | 2/20 | 0.50 |
| ▸ | CA4 | P22748 | 2/20 | 0.50 |
| ▸ | CA6 | P23280 | 2/20 | 0.50 |
| ▸ | CA7 | P43166 | 2/20 | 0.50 |
| ▸ | CA9 | Q16790 | 2/20 | 0.50 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.50 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.50 |
| ▸ | CA5A | P35218 | 1/20 | 0.50 |
| ▸ | PDE4A | P27815 | 1/20 | 0.45 |
| ▸ | PDE4B | Q07343 | 1/20 | 0.45 |
| ▸ | PDE4C | Q08493 | 1/20 | 0.45 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.45 |
| ▸ | EGFR | P00533 | 1/20 | 0.39 |
| ▸ | TTR | P02766 | 1/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13525455 | 0.87 | CA2 (0.50) | CA2CA12CA3CA4CA6 | |
| SCHEMBL29617406 | 0.87 | CA2 (0.50) | CA2CA12CA3CA4CA6 | |
| SCHEMBL29749150 | 0.87 | CA2 (0.54) | CA2CA12CA3CA4CA6 | |
| SCHEMBL1206769 | 0.87 | CA2 (0.54) | CA2CA12CA3CA4CA6 | |
| SCHEMBL3039135 | 0.85 | CA2 (0.52) | CA2CA12CA3CA4CA6 | |
| SCHEMBL29519804 | 0.81 | CYP1A2 (0.52) | CA2CA12CA3CA4CA6 | |
| SCHEMBL3923568 | 0.81 | CYP1A2 (0.52) | CA2CA12CA3CA4CA6 | |
| SCHEMBL14511722 | 0.79 | CA2 (0.44) | CA2CA12CA3CA4CA6 | |
| SCHEMBL10339312 | 0.79 | CA2 (0.44) | CA2CA12CA3CA4CA6 | |
| SCHEMBL17829700 | 0.79 | CA2 (0.44) | CA2CA12CA3CA4CA6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3229075-B1 | PHOTORESIST COMPOSITION, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING RESIST PATTERN | JSR CORP (JP) | 2021-01-06 | — | — | EP | disclosed |
| US-10725376-B2 | Pattern-forming method | JSR CORPORATION (JP) | 2020-07-28 | — | — | US | disclosed |
| US-20200041898-A1 | RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2020-02-06 | — | — | US | disclosed |
| US-20190094689-A1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2019-03-28 | — | — | US | disclosed |
| US-10209619-B2 | Composition and method of forming pattern using composition | JSR CORPORATION (JP) | 2019-02-19 | — | — | US | disclosed |
| US-10090163-B2 | Inorganic film-forming composition for multilayer resist processes, and pattern-forming method | JSR CORPORATION (JP) | 2018-10-02 | — | — | US | disclosed |
| US-20170362412-A1 | COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-12-21 | — | — | US | disclosed |
| EP-3229075-A1 | PHOTORESIST COMPOSITION, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING RESIST PATTERN | JSR Corporation (JP) | 2017-10-11 | — | — | EP | disclosed |
| US-20170269476-A1 | PHOTORESIST COMPOSITION, PRODUCTION METHOD OF PHOTORESIST COMPOSITION, AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-09-21 | — | — | US | disclosed |
| US-20170184961-A1 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20160349616-A1 | SEMICONDUCTOR DEVICE PRODUCTION COMPOSITION AND PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2016-12-01 | — | — | US | disclosed |
| US-20150364332-A1 | INORGANIC FILM-FORMING COMPOSITION FOR MULTILAYER RESIST PROCESSES, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-12-17 | — | — | US | disclosed |
| US-20150284539-A1 | COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-10-08 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10090163-B2 | Inorganic film-forming composition for multilayer resist processes, and pattern-forming method | HCAR1, HSD17B7, BMPR1A | CA2 1962/4885CA12 839/4885CA3 906/4885 |
| US-20150364332-A1 | INORGANIC FILM-FORMING COMPOSITION FOR MULTILAYER RESIST PROCESSES, AND PATTERN-FORMING METHOD | HCAR1, HSD17B7, BMPR1A | CA2 1962/4885CA12 839/4885CA3 906/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.