Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 7/20 | 0.59 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.59 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.59 |
| ▸ | HPGD | P15428 | 1/20 | 0.53 |
| ▸ | TP53 | P04637 | 3/20 | 0.48 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.48 |
| ▸ | THRB | P10828 | 2/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | ATM | Q13315 | 1/20 | 0.34 |
| ▸ | HCAR2 | Q8TDS4 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5160299 | 0.81 | TSHR (0.59) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL17138383 | 0.79 | ATM (0.44) | TSHRALDH1A1CYP3A4HPGDSMN1; SMN2 | |
| SCHEMBL244114 | 0.77 | TSHR (0.95) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL321925 | 0.77 | TSHR (0.85) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL23494302 | 0.77 | TSHR (0.63) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL8373745 | 0.77 | TSHR (0.63) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL8965481 | 0.76 | TSHR (0.57) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL1501338 | 0.76 | TSHR (0.56) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL31441003 | 0.76 | TSHR (0.61) | TSHRALDH1A1CYP3A4HPGDTP53 | |
| SCHEMBL26661210 | 0.76 | TSHR (0.61) | TSHRALDH1A1CYP3A4HPGDTP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260133485-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND UNDERLAYER FILM-FORMING COMPOSITION | JSR CORPORATION (JP) | 2026-05-14 | — | — | US | disclosed |
| US-20260093180-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION FOR FILM FORMATION | JSR CORPORATION (JP) | 2026-04-02 | — | — | US | disclosed |
| EP-4660703-A2 | METAL-CONTAINING FILM PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20250368837-A1 | Composition For Forming Metal-Containing Film And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-12-04 | — | — | US | disclosed |
| US-20250362595-A1 | COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-27 | — | — | US | disclosed |
| EP-4653955-A2 | COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-11-26 | — | — | EP | disclosed |
| EP-4606882-A1 | CLEANING SOLUTION, METHOD FOR CLEANING SUBSTRATE, AND METHOD FOR FORMING METAL-CONTAINING FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-08-27 | — | — | EP | disclosed |
| EP-4579346-A2 | COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-02 | — | — | EP | disclosed |
| EP-4579347-A2 | COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-02 | — | — | EP | disclosed |
| EP-4579348-A2 | COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-07-02 | — | — | EP | disclosed |
| US-20170362412-A1 | COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-12-21 | — | — | US | disclosed |
| EP-3244262-A1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMING METHOD | JSR Corporation (JP) | 2017-11-15 | — | — | EP | disclosed |
| US-9809489-B2 | Composition for forming a conductive film, a conductive film, a method for producing a plating film, a plating film, and an electronic device | JSR CORPORATION (JP) | 2017-11-07 | — | — | US | disclosed |
| US-20170299962-A1 | RADIATION-SENSITIVE COMPOSITION AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-10-19 | — | — | US | disclosed |
| EP-3229075-A1 | PHOTORESIST COMPOSITION, METHOD FOR MANUFACTURING SAME, AND METHOD FOR FORMING RESIST PATTERN | JSR Corporation (JP) | 2017-10-11 | — | — | EP | disclosed |
| US-20170269476-A1 | PHOTORESIST COMPOSITION, PRODUCTION METHOD OF PHOTORESIST COMPOSITION, AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-09-21 | — | — | US | disclosed |
| US-20170184960-A1 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20170184961-A1 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-06-29 | — | — | US | disclosed |
| US-20160081189-A1 | COMPOSITION FOR FORMING A CONDUCTIVE FILM, A CONDUCTIVE FILM, A METHOD FOR PRODUCING A PLATING FILM, A PLATING FILM, AND AN ELECTRONIC DEVICE | JSR CORPORATION (JP) | 2016-03-17 | — | — | US | disclosed |
| US-20150284539-A1 | COMPOSITION FOR FILM FORMATION, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-10-08 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260093180-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND COMPOSITION FOR FILM FORMATION | SMC4, TYR, SMC2 | TSHR 1574/4885ALDH1A1 2634/4885CYP3A4 252/4885 |
| US-20260133485-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE AND UNDERLAYER FILM-FORMING COMPOSITION | TWF2, TERF2, TPR | TSHR 1316/4885ALDH1A1 3632/4885CYP3A4 1752/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.