Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.43 |
| ▸ | TSHR | P16473 | 3/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.43 |
| ▸ | TP53 | P04637 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | GLA | P06280 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | DNMT1 | P26358 | 1/20 | 0.37 |
| ▸ | CACNA1B | Q00975 | 1/20 | 0.37 |
| ▸ | APBA1 | Q02410 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.37 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.37 |
| ▸ | HTR2A | P28223 | 3/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | MGLL | Q99685 | 2/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Catechol SCHEMBL679936 | 0.83 | TDP1 (0.52) | ALDH1A1TSHRSMN1; SMN2TP53CYP3A4 | |
| 1-Naphthol SCHEMBL4269425 | 0.83 | CYP1A2 (0.55) | ALDH1A1TSHRSMN1; SMN2TP53CYP3A4 | |
| Ethane SCHEMBL17093441 | 0.82 | ALDH1A1 (0.39) | ALDH1A1TSHRSMN1; SMN2TP53CYP3A4 | |
| SCHEMBL729500 | 0.82 | TSHR (0.46) | ALDH1A1TSHRSMN1; SMN2TP53CYP3A4 | |
| Pyrogallol SCHEMBL27626139 | 0.81 | ALDH1A1 (0.44) | ALDH1A1TSHRSMN1; SMN2TP53CYP3A4 | |
| SCHEMBL27944101 | 0.81 | ALDH1A1 (0.46) | ALDH1A1TSHRSMN1; SMN2TP53CYP3A4 | |
| Naphthalene SCHEMBL1054782 | 0.79 | TDP1 (0.55) | ALDH1A1TSHRSMN1; SMN2TP53CYP3A4 | |
| SCHEMBL394006 | 0.79 | TDP1 (0.47) | ALDH1A1TSHRSMN1; SMN2TP53CYP3A4 | |
| SCHEMBL1476399 | 0.79 | HSD17B1 (0.46) | ALDH1A1TSHRSMN1; SMN2TP53CYP3A4 | |
| SCHEMBL27722305 | 0.78 | TRPA1 (0.57) | ALDH1A1TSHRSMN1; SMN2TP53CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2085823-B1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING QUADRUPLE-LAYER LAMINATE | NISSAN CHEMICAL IND LTD (JP) | 2013-01-16 | — | — | EP | disclosed |
| CN-1965268-B | Antireflection film for semiconductor containing condensation type polymer | NISSAN CHEMICAL IND LTD | 2011-08-03 | — | — | CN | disclosed |
| EP-1876495-B1 | COMPOSITION COMPRISING POLYMER HAVING ETHYLENE-DICARBONYL STRUCTURE FOR USE IN FORMING ANTI-REFLECTIVE COATING FOR LITHOGRAPHY | NISSAN CHEMICAL IND LTD (JP) | 2011-07-20 | — | — | EP | disclosed |
| US-7842620-B2 | Method for manufacturing semiconductor device using quadruple-layer laminate | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-30 | — | — | US | disclosed |
| US-20100022089-A1 | Method for manufacturing semiconductor device using quadruple-layer laminate | NISSIAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-01-28 | — | — | US | disclosed |
| US-7632626-B2 | a polyester copolymer of fumaric acid and a diglycidyl ether with backbone of groups selected from substituted or unsubstituted alkylene, phenylene, napthylene, anthrylene, phthalic acid, triazinetrione etc. 1,3,4,6-tetrakis(methtoxymethyl)glycoluril crosslinker, a sulfonium or iodonium acid generator | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-12-15 | — | — | US | disclosed |
| EP-2085823-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING QUADRUPLE-LAYER LAMINATE | Nissan Chemical Industries, Ltd. (JP) | 2009-08-05 | — | — | EP | disclosed |
| US-20080268379-A1 | a polyester copolymer of fumaric acid and a diglycidyl ether with backbone of groups selected from substituted or unsubstituted alkylene, phenylene, napthylene, anthrylene, phthalic acid, triazinetrione etc. 1,3,4,6-tetrakis(methtoxymethyl)glycoluril crosslinker, a sulfonium or iodonium acid generator | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-10-30 | — | — | US | disclosed |
| EP-1876495-A1 | COMPOSITION COMPRISING POLYMER HAVING ETHYLENE-DICARBONYL STRUCTURE FOR USE IN FORMING ANTI-REFLECTIVE COATING FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2008-01-09 | — | — | EP | disclosed |
| CN-1965268-A | Antireflection film for semiconductor containing condensation type polymer | NISSAN CHEMICAL IND LTD (JP) | 2007-05-16 | — | — | CN | disclosed |