⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9486472 | 0.66 | — | — | |
| SCHEMBL391495 | 0.66 | TSHR (0.36) | — | |
| SCHEMBL304628 | 0.65 | — | — | |
| SCHEMBL393926 | 0.63 | — | — | |
| SCHEMBL305971 | 0.61 | — | — | |
| SCHEMBL390205 | 0.61 | — | — | |
| SCHEMBL65415 | 0.59 | THRB (0.36) | — | |
| SCHEMBL21373882 | 0.57 | NPC1 (0.41) | — | |
| SCHEMBL6292018 | 0.56 | THRB (0.51) | — | |
| SCHEMBL306060 | 0.55 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10564543-B2 | Photosensitive resin composition, photosensitive element, method for producing substrate with resist pattern, and method for producing printed wiring board | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2020-02-18 | — | — | US | disclosed |
| US-20170261851-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR PRODUCING SUBSTRATE WITH RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD | RESONAC CORPORATION (JP) | 2017-09-14 | — | — | US | disclosed |
| US-20150293443-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2015-10-15 | — | — | US | disclosed |