Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 2/20 | 0.34 |
| ▸ | USP2 | O75604 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.34 |
| ▸ | BLM | P54132 | 1/20 | 0.34 |
| ▸ | CACNA2D1 | P54289 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10165469 | 0.98 | CYP1A2 (0.37) | CYP1A2USP2ALDH1A1LMNATSHR | |
| SCHEMBL10941333 | 0.88 | ALDH1A1 (0.41) | CYP1A2USP2ALDH1A1LMNATSHR | |
| SCHEMBL15492922 | 0.81 | — | — | |
| SCHEMBL15492892 | 0.79 | USP2 (0.32) | CYP1A2USP2ALDH1A1LMNATSHR | |
| SCHEMBL9895608 | 0.78 | EPHX1 (0.31) | TSHR | |
| SCHEMBL8267491 | 0.77 | ALDH1A1 (0.42) | CYP1A2USP2ALDH1A1LMNATSHR | |
| SCHEMBL2064950 | 0.76 | CYP1A2 (0.38) | CYP1A2USP2ALDH1A1LMNATSHR | |
| SCHEMBL2680378 | 0.74 | CYP1A2 (0.41) | CYP1A2USP2ALDH1A1LMNATSHR | |
| SCHEMBL14658792 | 0.74 | CYP1A2 (0.41) | CYP1A2USP2ALDH1A1LMNATSHR | |
| SCHEMBL2920990 | 0.74 | CYP1A2 (0.59) | CYP1A2USP2ALDH1A1LMNATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2434343-A1 | Resist composition, resist film therefrom and method of forming pattern therewith | Fujifilm Corporation (JP) | 2012-03-28 | — | — | EP | disclosed |
| EP-2426154-A1 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | Fujifilm Corporation (JP) | 2012-03-07 | — | — | EP | disclosed |
| WO-2011025070-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-03-03 | — | — | WO | disclosed |
| EP-2009498-A1 | Pattern forming method | FUJIFILM Corporation (JP) | 2008-12-31 | — | — | EP | disclosed |
| EP-2003509-A2 | Pattern forming method | FUJIFILM Corporation (JP) | 2008-12-17 | — | — | EP | disclosed |