Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 3/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17247239 | 0.88 | ALDH1A1 (0.41) | ALDH1A1PTPN1TSHRTHRB | |
| SCHEMBL76528 | 0.84 | ALDH1A1 (0.39) | ALDH1A1PTPN1 | |
| SCHEMBL16372849 | 0.83 | PTPN1 (0.32) | PTPN1 | |
| SCHEMBL21135142 | 0.82 | PTPN1 (0.35) | PTPN1 | |
| SCHEMBL25129601 | 0.80 | PTPN1 (0.33) | PTPN1 | |
| SCHEMBL19101361 | 0.79 | ALDH1A1 (0.38) | ALDH1A1PTPN1TSHR | |
| SCHEMBL16372848 | 0.79 | PTPN1 (0.35) | ALDH1A1PTPN1TSHR | |
| SCHEMBL23474825 | 0.79 | PTPN1 (0.30) | PTPN1 | |
| SCHEMBL12883848 | 0.78 | ALDH1A1 (0.35) | ALDH1A1TSHR | |
| SCHEMBL14944749 | 0.77 | ALDH1A1 (0.44) | ALDH1A1TSHRTHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11874603-B2 | Photoresist composition comprising amide compound and pattern formation methods using the same | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2024-01-16 | — | — | US | disclosed |
| US-11829069-B2 | Photoresist compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-11-28 | — | — | US | disclosed |
| US-11487203-B2 | Monomers, polymers and photoresist compositions | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2022-11-01 | — | — | US | disclosed |
| US-11016388-B2 | Overcoat compositions and methods for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2021-05-25 | — | — | US | disclosed |
| US-10719014-B2 | Photoresists comprising amide component | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-07-21 | — | — | US | disclosed |
| US-10564542-B2 | Photoresist compositions and methods | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2020-02-18 | — | — | US | disclosed |
| US-20180203352-A1 | MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2018-07-19 | — | — | US | disclosed |
| US-20180203352-A1 | MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2018-07-19 | — | — | US | disclosed |
| US-20180059545-A1 | MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2018-03-01 | — | — | US | disclosed |
| US-20170090287-A1 | OVERCOAT COMPOSITIONS AND METHODS FOR PHOTOLITHOGRAPHY | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2017-03-30 | — | — | US | disclosed |
| US-20120129108-A1 | BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-05-24 | — | — | US | disclosed |
| US-20120129108-A1 | BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-05-24 | — | — | US | disclosed |
| EP-2452932-A2 | Base reactive photoacid generators and photoresists comprising same | Rohm and Haas Electronic Materials LLC (US) | 2012-05-16 | — | — | EP | disclosed |
| US-20120077120-A1 | PHOTORESISTS COMPRISING MULTI-AMIDE COMPONENT | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-03-29 | — | — | US | disclosed |
| US-20120077120-A1 | PHOTORESISTS COMPRISING MULTI-AMIDE COMPONENT | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-03-29 | — | — | US | disclosed |
| EP-2428842-A1 | Photoresists comprising multi-amide component | Rohm and Haas Electronic Materials LLC (US) | 2012-03-14 | — | — | EP | disclosed |
| US-8105760-B2 | Patterning process and pattern surface coating composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-31 | — | — | US | disclosed |
| US-8105760-B2 | Patterning process and pattern surface coating composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-31 | — | — | US | disclosed |
| US-20090053657-A1 | PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-26 | — | — | US | disclosed |
| US-20090053657-A1 | PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11016388-B2 | Overcoat compositions and methods for photolithography | OGT, COLGALT1, PARG | ALDH1A1 2382/4885PTPN1 962/4885TSHR 4812/4885 |
| US-10564542-B2 | Photoresist compositions and methods | PARG, PNN, PARN | ALDH1A1 4826/4885PTPN1 1643/4885TSHR 4722/4885 |
| US-10719014-B2 | Photoresists comprising amide component | ASPH, ALAD, SUN2 | ALDH1A1 823/4885PTPN1 4543/4885TSHR 4127/4885 |
| US-20170090287-A1 | OVERCOAT COMPOSITIONS AND METHODS FOR PHOTOLITHOGRAPHY | OGT, COLGALT1, PARG | ALDH1A1 2382/4885PTPN1 962/4885TSHR 4812/4885 |
| US-11487203-B2 | Monomers, polymers and photoresist compositions | MAP1LC3C, LCP1, PIN1 | ALDH1A1 2061/4885PTPN1 2710/4885TSHR 4290/4885 |
| US-20120129108-A1 | BASE REACTIVE PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | ALAD, APEX1, HMBS | ALDH1A1 1611/4885PTPN1 4581/4885TSHR 3784/4885 |
| US-20180059545-A1 | MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS | PARG, LCP1, ALG3 | ALDH1A1 894/4885PTPN1 2814/4885TSHR 4727/4885 |
| US-20180203352-A1 | MONOMERS, POLYMERS AND PHOTORESIST COMPOSITIONS | MAP1LC3C, LCP1, PIN1 | ALDH1A1 2061/4885PTPN1 2710/4885TSHR 4290/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.