SCHEMBL17271402

SCHEMBL17271402

CCCCc1c(CCC)[nH]c(=S)[nH]c1=O

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.49
ALDH1A1 P00352 3/20 0.47
TYMP P19971 4/20 0.46
PKM P14618 1/20 0.44
FFAR3 O14843 1/20 0.42
FFAR2 O15552 1/20 0.42
HCAR2 Q8TDS4 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
KMT2A Q03164 2/20 0.41
MEN1 O00255 1/20 0.41
POLB P06746 1/20 0.41
TDP1 Q9NUW8 1/20 0.41
MAPT P10636 1/20 0.40
HTT P42858 1/20 0.40
MPO P05164 1/20 0.40
TPO P07202 1/20 0.40
TSHR P16473 1/20 0.40
LPO P22079 1/20 0.40
CYP2C19 P33261 1/20 0.40
TAS2R38 P59533 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14502537 0.90 ALDH1A1 (0.49) KDM4EALDH1A1TYMPPKMFFAR3
SCHEMBL11736480 0.89 KDM4E (0.49) KDM4EALDH1A1TYMPPKMFFAR3
SCHEMBL649170 0.81 KDM4E (0.71) KDM4EALDH1A1TYMPPKMFFAR3
SCHEMBL17271400 0.80 L3MBTL1 (0.56) KDM4EALDH1A1TYMPPKMFFAR3
SCHEMBL6632608 0.80 KDM4E (0.69) KDM4EALDH1A1TYMPPKMFFAR3
SCHEMBL11732073 0.79 ALDH1A1 (0.46) KDM4EALDH1A1TYMPFFAR3FFAR2
SCHEMBL4978570 0.76 KDM4E (0.68) KDM4EALDH1A1TYMPFFAR3HCAR2
SCHEMBL11734739 0.74 KMT2A (0.42) KDM4EALDH1A1PKMFFAR3FFAR2
SCHEMBL28943163 0.74 MPO (0.42) KDM4EALDH1A1PKMFFAR3FFAR2
SCHEMBL11733060 0.73 ALDH1A1 (0.41) KDM4EALDH1A1TYMPFFAR3FFAR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9875904-B2 Silicon etching liquid, silicon etching method, and microelectromechanical element MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-01-23 US claimed
US-20150340241-A1 SILICON ETCHING LIQUID, SILICON ETCHING METHOD, AND MICROELECTROMECHANICAL ELEMENT MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2015-11-26 US claimed
US-9875904-B2 Silicon etching liquid, silicon etching method, and microelectromechanical element MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2018-01-23 US disclosed
US-20150340241-A1 SILICON ETCHING LIQUID, SILICON ETCHING METHOD, AND MICROELECTROMECHANICAL ELEMENT MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2015-11-26 US disclosed