Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6559951 | 0.87 | ALDH1A1 (0.35) | ALDH1A1 | |
| SCHEMBL12783371 | 0.82 | EPHX1 (0.37) | ALDH1A1 | |
| SCHEMBL5608348 | 0.78 | EPHX1 (0.31) | — | |
| SCHEMBL12783362 | 0.77 | TSHR (0.43) | ALDH1A1 | |
| SCHEMBL1733315 | 0.76 | TGFBR1 (0.32) | ALDH1A1 | |
| SCHEMBL5608213 | 0.76 | EPHX1 (0.31) | — | |
| SCHEMBL16039566 | 0.75 | EPHX1 (0.32) | — | |
| SCHEMBL6560165 | 0.73 | EPHX2 (0.39) | — | |
| SCHEMBL12783403 | 0.73 | — | — | |
| SCHEMBL5608231 | 0.73 | EPHX1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9726976-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |
| US-9726976-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |
| EP-1443363-B1 | Photoresist composition | DAICEL CHEM (JP) | 2013-07-10 | — | — | EP | disclosed |
| EP-0999474-B1 | Photoresist resin composition and method for forming a pattern | DAICEL CHEM (JP) | 2011-11-23 | — | — | EP | disclosed |
| US-20110065041-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20110065041-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20100203446-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-08-12 | — | — | US | disclosed |
| US-20100203446-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-08-12 | — | — | US | disclosed |
| EP-1443363-A2 | Compounds for photoresist and resin composition for photoresist | Daicel Chemical Industries, Ltd. (JP) | 2004-08-04 | — | — | EP | disclosed |
| US-6391520-B1 | ADAMANTANE COMPOUND OR POLYMER AND PHOTOACID GENERATORS; ETCHING RESISTANCE; SOLUBILIZABLE BY IRRADIATION WITH LIGHT; MINUTE PATTERNS | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-05-21 | — | — | US | disclosed |
| EP-0999474-A1 | COMPOUNDS FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST | Daicel Chemical Industries, Ltd. (JP) | 2000-05-10 | — | — | EP | disclosed |