Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.48 |
| ▸ | THRB | P10828 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | APEX1 | P27695 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1389356 | 0.82 | THRB (0.50) | TSHRTHRBALDH1A1TDP1POLB | |
| SCHEMBL342382 | 0.81 | GLO1 (0.32) | ALDH1A1 | |
| SCHEMBL12705842 | 0.81 | TSHR (0.44) | TSHRTHRBALDH1A1TDP1POLB | |
| SCHEMBL1087310 | 0.80 | TSHR (0.47) | TSHRTHRBALDH1A1TDP1POLB | |
| SCHEMBL17850089 | 0.80 | TSHR (0.47) | TSHRTHRBALDH1A1TDP1POLB | |
| SCHEMBL10950285 | 0.80 | TSHR (0.47) | TSHRTHRBALDH1A1TDP1POLB | |
| SCHEMBL1755549 | 0.79 | TSHR (0.56) | TSHRTHRBALDH1A1TDP1POLB | |
| SCHEMBL7077509 | 0.79 | TSHR (0.50) | TSHRTHRBALDH1A1TDP1POLB | |
| SCHEMBL7121709 | 0.78 | THRB (0.52) | TSHRTHRBALDH1A1TDP1POLB | |
| SCHEMBL1755557 | 0.78 | TSHR (0.50) | TSHRTHRBALDH1A1TDP1POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9235122-B2 | Monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-01-12 | — | — | US | disclosed |
| US-9235122-B2 | Monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-01-12 | — | — | US | disclosed |
| US-9213235-B2 | Patterning process, resist composition, polymer, and monomer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-15 | — | — | US | disclosed |
| US-9213235-B2 | Patterning process, resist composition, polymer, and monomer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-12-15 | — | — | US | disclosed |