SCHEMBL17341907

SCHEMBL17341907

O=C(/C(=N\OC(=O)N1CCOCC1)c1nc2cc(Br)ccc2s1)c1ccccc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SMN1; SMN2 Q16637 5/20 0.48
▸ LMNA P02545 4/20 0.48
▸ HTT P42858 3/20 0.48
▸ RAB9A P51151 4/20 0.47
▸ MAPT P10636 3/20 0.47
▸ NPC1 O15118 3/20 0.47
▸ L3MBTL1 Q9Y468 1/20 0.47
▸ PLA2G7 Q13093 1/20 0.45
▸ PKM P14618 1/20 0.42
▸ KMT2A Q03164 4/20 0.41
▸ TUBB4A P04350 1/20 0.39
▸ TUBB P07437 1/20 0.39
▸ TUBA3C P0DPH7 1/20 0.39
▸ TUBA1B P68363 1/20 0.39
▸ TUBA4A P68366 1/20 0.39
▸ TUBB4B P68371 1/20 0.39
▸ TUBB3 Q13509 1/20 0.39
▸ TUBB2A Q13885 1/20 0.39
▸ TUBB8 Q3ZCM7 1/20 0.39
▸ TUBA3E Q6PEY2 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17341912 0.89 SMN1; SMN2 (0.48) SMN1; SMN2LMNAHTTRAB9AMAPT
SCHEMBL17341905 0.89 SMN1; SMN2 (0.54) SMN1; SMN2LMNAHTTRAB9AMAPT
SCHEMBL17109225 0.67 SMN1; SMN2 (0.59) SMN1; SMN2LMNARAB9AMAPTNPC1
SCHEMBL17341923 0.66 SMN1; SMN2 (0.68) SMN1; SMN2LMNAHTTRAB9AMAPT
SCHEMBL4156994 0.65 PPARA (0.57) SMN1; SMN2RAB9ANPC1KMT2ATUBB4A
SCHEMBL17341917 0.65 SMN1; SMN2 (0.50) SMN1; SMN2LMNAHTTRAB9AMAPT
SCHEMBL17341897 0.64 SMN1; SMN2 (0.49) SMN1; SMN2LMNAHTTRAB9AMAPT
SCHEMBL14020936 0.64 TUBB4A (0.64) RAB9ANPC1TUBB4ATUBBTUBA3C
SCHEMBL16306693 0.63 RAB9A (0.49) SMN1; SMN2LMNARAB9ANPC1TUBB4A
SCHEMBL28919886 0.63 DYRK1A (0.63) SMN1; SMN2LMNARAB9ANPC1TUBB4A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9488911-B2 Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device FUJIFILM CORPORATION (JP) 2016-11-08 — — US disclosed
US-9488911-B2 Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device FUJIFILM CORPORATION (JP) 2016-11-08 — — US disclosed
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-12-17 — — US disclosed
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-12-17 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE POLQ, POLR1A, POLI SMN1; SMN2 4427/4885LMNA 1543/4885HTT 2890/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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