SCHEMBL17341917

SCHEMBL17341917

CC(C)(C)C(=O)/C(=N\OC(=O)N1CCCC1)c1nc2ccccc2s1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ SMN1; SMN2 Q16637 3/20 0.50
▸ TSHR P16473 2/20 0.46
▸ ALOX15 P16050 1/20 0.46
▸ CASP1 P29466 1/20 0.46
▸ RAB9A P51151 7/20 0.45
▸ HPGD P15428 2/20 0.45
▸ NPC1 O15118 4/20 0.44
▸ ALDH1A1 P00352 5/20 0.44
▸ LMNA P02545 3/20 0.44
▸ L3MBTL1 Q9Y468 1/20 0.44
▸ MAPT P10636 4/20 0.43
▸ MEN1 O00255 1/20 0.43
▸ KMT2A Q03164 1/20 0.43
▸ POLB P06746 2/20 0.42
▸ GAA P10253 2/20 0.42
▸ KDM4E B2RXH2 1/20 0.42
▸ HSF1 Q00613 2/20 0.40
▸ GPR119 Q8TDV5 1/20 0.40
▸ HSD17B10 Q99714 1/20 0.40
▸ RAF1 P04049 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17341897 0.99 SMN1; SMN2 (0.49) SMN1; SMN2TSHRALOX15CASP1RAB9A
SCHEMBL17341927 0.82 RAB9A (0.39) SMN1; SMN2ALOX15RAB9AHPGDNPC1
SCHEMBL17341919 0.77 MAOB (0.44) SMN1; SMN2TSHRALOX15CASP1RAB9A
SCHEMBL17341906 0.76 XDH (0.43) SMN1; SMN2RAB9AHPGDNPC1LMNA
SCHEMBL17341921 0.76 SMN1; SMN2 (0.47) SMN1; SMN2RAB9AHPGDNPC1ALDH1A1
SCHEMBL17341930 0.75 NPC1 (0.46) SMN1; SMN2TSHRALOX15CASP1RAB9A
SCHEMBL17341905 0.75 SMN1; SMN2 (0.54) SMN1; SMN2TSHRRAB9AHPGDNPC1
SCHEMBL18212184 0.75 ALDH1A1 (0.46) SMN1; SMN2TSHRALOX15CASP1RAB9A
SCHEMBL17341915 0.74 PAX8 (0.46) SMN1; SMN2TSHRALOX15CASP1RAB9A
SCHEMBL16381778 0.72 MAPT (0.44) SMN1; SMN2TSHRALOX15CASP1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9488911-B2 Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device FUJIFILM CORPORATION (JP) 2016-11-08 — — US disclosed
US-9488911-B2 Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device FUJIFILM CORPORATION (JP) 2016-11-08 — — US disclosed
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-12-17 — — US disclosed
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-12-17 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE POLQ, POLR1A, POLI SMN1; SMN2 4427/4885TSHR 3172/4885ALOX15 527/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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