SCHEMBL17341920

SCHEMBL17341920

CCCCN(C(=O)O/N=C(\C(=O)C(C)(C)C)c1nc2ccccc2s1)c1ccncc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ GAA P10253 2/20 0.40
▸ PDE10A Q9Y233 1/20 0.39
▸ ALDH1A1 P00352 7/20 0.37
▸ L3MBTL1 Q9Y468 2/20 0.37
▸ ALOX15 P16050 1/20 0.37
▸ TSHR P16473 1/20 0.37
▸ CASP1 P29466 1/20 0.37
▸ LMNA P02545 1/20 0.37
▸ NPC1 O15118 4/20 0.36
▸ RAB9A P51151 4/20 0.36
▸ MAPT P10636 2/20 0.36
▸ MCL1 Q07820 1/20 0.36
▸ KDM4E B2RXH2 2/20 0.35
▸ MITF O75030 1/20 0.35
▸ HPGD P15428 1/20 0.35
▸ SMN1; SMN2 Q16637 4/20 0.35
▸ CYP1A2 P05177 1/20 0.35
▸ NFKB1 P19838 1/20 0.35
▸ CYP2C19 P33261 1/20 0.35
▸ STAT1 P42224 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17341915 0.84 PAX8 (0.46) GAAPDE10AALDH1A1L3MBTL1ALOX15
SCHEMBL17341930 0.76 NPC1 (0.46) ALDH1A1L3MBTL1ALOX15TSHRCASP1
SCHEMBL17341919 0.72 MAOB (0.44) GAAALDH1A1L3MBTL1ALOX15TSHR
SCHEMBL17341911 0.70 GAA (0.45) GAAALDH1A1L3MBTL1ALOX15TSHR
SCHEMBL17341917 0.70 SMN1; SMN2 (0.50) GAAALDH1A1L3MBTL1ALOX15TSHR
SCHEMBL17341897 0.69 SMN1; SMN2 (0.49) GAAALDH1A1L3MBTL1ALOX15TSHR
SCHEMBL18212184 0.68 ALDH1A1 (0.46) ALDH1A1L3MBTL1ALOX15TSHRCASP1
SCHEMBL17341900 0.67 MEN1 (0.38) GAAALDH1A1L3MBTL1ALOX15TSHR
SCHEMBL16381778 0.66 MAPT (0.44) GAAALDH1A1L3MBTL1ALOX15TSHR
SCHEMBL17341910 0.65 TSHR (0.51) GAAALDH1A1L3MBTL1ALOX15TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9488911-B2 Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device FUJIFILM CORPORATION (JP) 2016-11-08 — — US disclosed
US-9488911-B2 Photosensitive composition, photocurable composition, chemical amplification resist composition, resist film, pattern forming method, method of manufacturing electronic device and electronic device FUJIFILM CORPORATION (JP) 2016-11-08 — — US disclosed
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-12-17 — — US disclosed
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-12-17 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20150362836-A1 PHOTOSENSITIVE COMPOSITION, PHOTOCURABLE COMPOSITION, CHEMICAL AMPLIFICATION RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE AND ELECTRONIC DEVICE POLQ, POLR1A, POLI GAA 2033/4885PDE10A 963/4885ALDH1A1 743/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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