Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6440412 | 0.80 | ALDH1A1 (0.32) | — | |
| SCHEMBL6064302 | 0.80 | — | — | |
| SCHEMBL723671 | 0.75 | TET2 (0.33) | TET2 | |
| SCHEMBL6063940 | 0.75 | KDM4E (0.34) | — | |
| SCHEMBL6063729 | 0.75 | TET2 (0.31) | TET2 | |
| SCHEMBL2804484 | 0.75 | TET2 (0.31) | TET2 | |
| SCHEMBL10952663 | 0.72 | KDM4E (0.32) | — | |
| SCHEMBL6063482 | 0.72 | KDM4E (0.41) | — | |
| SCHEMBL203037 | 0.71 | — | — | |
| SCHEMBL128482 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8168690-B2 | Optical discs; scratch resistance | SONY CHEMICAL & INFORMATION DEVICE CORP. (JP) | 2012-05-01 | — | — | US | claimed |
| EP-1777700-B1 | NON-SOLVENT TYPE PHOTOCURABLE RESIN COMPOSITION FOR PROTECTION FILM | SONY CHEM & INF DEVICE CORP (JP) | 2011-11-16 | — | — | EP | claimed |
| US-20110264567-A1 | Systems and Methods to Provide Data Services | VISA U.S.A. INC. (US) | 2011-10-27 | — | — | US | claimed |
| US-20080153937-A1 | Solvent-Free Photocurable Resin Composition for Protective Film | SONY CHEMICAL & INFORMATION DEVICE CORP. (JP) | 2008-06-26 | — | — | US | claimed |
| EP-1777700-A1 | NON-SOLVENT TYPE PHOTOCURABLE RESIN COMPOSITION FOR PROTECTION FILM | Sony Chemical & Information Device Corporation (JP) | 2007-04-25 | — | — | EP | claimed |
| CN-111065967-B | Positive resist composition, method for forming resist film, and method for producing laminate | 日本瑞翁株式会社 | 2023-06-23 | — | — | CN | disclosed |
| US-8507189-B2 | Upper layer film forming composition and method of forming photoresist pattern | JSR CORPORATION (JP) | 2013-08-13 | — | — | US | disclosed |
| US-8431332-B2 | Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist pattern | JSR CORPORATION (JP) | 2013-04-30 | — | — | US | disclosed |
| US-8168690-B2 | Optical discs; scratch resistance | SONY CHEMICAL & INFORMATION DEVICE CORP. (JP) | 2012-05-01 | — | — | US | disclosed |
| EP-1777700-B1 | NON-SOLVENT TYPE PHOTOCURABLE RESIN COMPOSITION FOR PROTECTION FILM | SONY CHEM & INF DEVICE CORP (JP) | 2011-11-16 | — | — | EP | disclosed |
| US-20110264567-A1 | Systems and Methods to Provide Data Services | VISA U.S.A. INC. (US) | 2011-10-27 | — | — | US | disclosed |
| US-20100255416-A1 | COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UPPER LAYER FILM FOR IMMERSION EXPOSURE, AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |
| US-20100040974-A1 | UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2010-02-18 | — | — | US | disclosed |
| US-20080153937-A1 | Solvent-Free Photocurable Resin Composition for Protective Film | SONY CHEMICAL & INFORMATION DEVICE CORP. (JP) | 2008-06-26 | — | — | US | disclosed |
| EP-1777700-A1 | NON-SOLVENT TYPE PHOTOCURABLE RESIN COMPOSITION FOR PROTECTION FILM | Sony Chemical & Information Device Corporation (JP) | 2007-04-25 | — | — | EP | disclosed |
| US-7148363-B2 | Process for preparing acrylate compound | TOSOH CORPORATION (JP) | 2006-12-12 | — | — | US | disclosed |
| US-20050148789-A1 | Process for preparing acrylate compound | TOSOH CORPORATION | 2005-07-07 | — | — | US | disclosed |
| US-6833462-B2 | Esterification to get cyclic acrylate compounds; used as raw material for functional polymers, pharmaceuticals, pesticides, semiconductor lithography | TOSOH CORPORATION (JP) | 2004-12-21 | — | — | US | disclosed |
| US-20030139613-A1 | Process for preparing acrylate compound | TOSOH CORPORATION | 2003-07-24 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030139613-A1 | Process for preparing acrylate compound | AFF1, AFF4, RER1 | PKM 2317/4885TET2 1456/4885 |
| US-20050148789-A1 | Process for preparing acrylate compound | ACR, AFF4, AFF1 | PKM 1776/4885TET2 1202/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.