SCHEMBL1737650

SCHEMBL1737650

O=C(O)/C=C(\C(=O)O)N1CCCC1=O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.48
KMT2A Q03164 2/20 0.38
BLM P54132 2/20 0.37
CYP1A2 P05177 2/20 0.37
CYP2D6 P10635 2/20 0.37
CYP2C9 P11712 2/20 0.37
CYP2C19 P33261 2/20 0.37
MAPT P10636 2/20 0.37
KDM4E B2RXH2 1/20 0.37
MEN1 O00255 1/20 0.37
THRB P10828 1/20 0.37
RECQL P46063 1/20 0.37
ALDH1A1 P00352 3/20 0.35
TSHR P16473 1/20 0.34
BRD4 O60885 1/20 0.33
BRD2 P25440 1/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
MITF O75030 1/20 0.33
INMT O95050 1/20 0.33
POLB P06746 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28129585 1.00 LMNA (0.48) LMNAKMT2ABLMCYP1A2CYP2D6
SCHEMBL1737652 1.00 LMNA (0.48) LMNAKMT2ABLMCYP1A2CYP2D6
SCHEMBL3378768 0.83 LMNA (0.50) LMNAKMT2ABLMCYP1A2CYP2D6
SCHEMBL3378778 0.83 LMNA (0.50) LMNAKMT2ABLMCYP1A2CYP2D6
SCHEMBL3378771 0.83 LMNA (0.50) LMNAKMT2ABLMCYP1A2CYP2D6
SCHEMBL9028024 0.79 LMNA (0.46) LMNAKMT2ABLMCYP1A2CYP2D6
SCHEMBL28865484 0.78 FGFR4 (0.34) LMNAKMT2ABLMCYP1A2CYP2D6
SCHEMBL4669428 0.78 LMNA (0.42) LMNAKMT2ABLMCYP1A2CYP2D6
SCHEMBL4669427 0.78 LMNA (0.42) LMNAKMT2ABLMCYP1A2CYP2D6
SCHEMBL3858131 0.77 LMNA (0.49) LMNAKMT2ABLMCYP1A2CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3042718-A1 DEVICE FOR SOLUBILIZING, SEPARATING, REMOVING AND REACTING CARBOXYLIC ACIDS IN OILS, FATS, AQUEOUS OR ORGANIC SOLUTIONS BY MEANS OF MICRO- OR NANOEMULSIFICATION Dietz, Ulrich (DE) 2016-07-13 EP disclosed
US-20160122686-A1 DEVICE AND METHOD FOR SOLUBILIZING, SEPARATING, REMOVING AND REACTING CARBOXYLIC ACIDS IN OILS, FATS, AQUEOUS OR ORGANIC SOLUTIONS BY MEANS OF MICRO-OR NANOEMULSIFICATION DIETZ ULRICH (DE) 2016-05-05 US disclosed
EP-2585420-B1 METHOD FOR SOLUBILIZING, SEPARATING, REMOVING AND REACTING CARBOXYLIC ACIDS IN OILS, FATS, AQUEOUS OR ORGANIC SOLUTIONS BY MEANS OF MICRO- OR NANOEMULSIFICATION DIETZ ULRICH (DE) 2016-04-06 EP disclosed
US-9127233-B2 Device and method for solubilizing, separating, removing and reacting carboxylic acids in oils, fats, aqueous or organic solutions by means of micro-or nanoemulsification Dietz, Ulrich (DE) 2015-09-08 US disclosed
EP-2585420-A2 DEVICE AND METHOD FOR SOLUBILIZING, SEPARATING, REMOVING AND REACTING CARBOXYLIC ACIDS IN OILS, FATS, AQUEOUS OR ORGANIC SOLUTIONS BY MEANS OF MICRO- OR NANOEMULSIFICATION Dietz, Ulrich (DE) 2013-05-01 EP disclosed
US-20130090488-A1 DEVICE AND METHOD FOR SOLUBILIZING, SEPARATING, REMOVING AND REACTING CARBOXYLIC ACIDS IN OILS, FATS, AQUEOUS OR ORGANIC SOLUTIONS BY MEANS OF MICRO-OR NANOEMULSIFICATION DIETZ ULRICH (DE) 2013-04-11 US disclosed
CN-101849209-B Composition for forming top anti-reflection film and pattern forming method using the same AZ ELECTRONIC MATERIALS JAPAN 2012-11-28 CN disclosed
CN-101568991-B Top anti-reflective coating composition, method of forming pattern, and top anti-reflective coating AZ ELECTRONIC MATERIALS JAPAN 2012-05-30 CN disclosed
WO-2011160857-A2 DEVICE AND METHOD FOR SOLUBILIZING, SEPARATING, REMOVING AND REACTING CARBOXYLIC ACIDS IN OILS, FATS, AQUEOUS OR ORGANIC SOLUTIONS BY MEANS OF MICRO- OR NANOEMULSIFICATION DIETZ ULRICH (DE) 2011-12-29 WO disclosed
EP-2399885-A1 Device and method for solubilizing, separating, removing and reacting carboxylic acids in aqueous or organic solutions by means of micro- or nanoemulsification Dietz, Ulrich (DE) 2011-12-28 EP disclosed
CN-101849209-A Composition for forming top anti-reflection film and pattern forming method using the same AZ ELECTRONIC MATERIALS JAPAN 2010-09-29 CN disclosed
CN-100587600-C Composition for antireflection coating and pattern formation method using the same DAINIPPON INK & CHEMICALS 2010-02-03 CN disclosed
CN-101568991-A Composition for forming antireflection film and pattern forming method using the same AZ ELECTRONIC MATERIALS JAPAN (JP) 2009-10-28 CN disclosed
CN-101031846-A Composition for antireflection coating and pattern formation method using the same DAINIPPON INK & CHEMICALS (JP) 2007-09-05 CN disclosed