Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC4 | P56524 | 1/20 | 0.62 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.62 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.62 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.56 |
| ▸ | GAA | P10253 | 2/20 | 0.56 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.56 |
| ▸ | USP2 | O75604 | 1/20 | 0.56 |
| ▸ | PKM | P14618 | 1/20 | 0.56 |
| ▸ | HPGD | P15428 | 1/20 | 0.56 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.56 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.56 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.56 |
| ▸ | ADRB1 | P08588 | 2/20 | 0.53 |
| ▸ | ADRA1A | P35348 | 2/20 | 0.53 |
| ▸ | MIF | P14174 | 1/20 | 0.53 |
| ▸ | HTR2A | P28223 | 1/20 | 0.53 |
| ▸ | HTR2B | P41595 | 1/20 | 0.53 |
| ▸ | HIF1A | Q16665 | 4/20 | 0.51 |
| ▸ | LMNA | P02545 | 4/20 | 0.51 |
| ▸ | GALR3 | O60755 | 1/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL97542 | 1.00 | HDAC4 (0.62) | HDAC4HDAC2HDAC8ALDH1A1GAA | |
| Butane SCHEMBL28745339 | 0.96 | HDAC4 (0.59) | HDAC4HDAC2HDAC8ALDH1A1GAA | |
| Phenol SCHEMBL28146813 | 0.88 | HDAC4 (0.59) | HDAC4HDAC2HDAC8ALDH1A1GAA | |
| SCHEMBL1006801 | 0.84 | HDAC4 (0.62) | HDAC4HDAC2HDAC8ALDH1A1GAA | |
| SCHEMBL6912280 | 0.84 | ADRB1 (0.50) | HDAC4HDAC2HDAC8ALDH1A1GAA | |
| SCHEMBL20738464 | 0.83 | ADRB1 (0.53) | HDAC4HDAC2HDAC8ALDH1A1GAA | |
| SCHEMBL9169343 | 0.83 | ADRB1 (0.53) | HDAC4HDAC2HDAC8ALDH1A1GAA | |
| Phenol SCHEMBL28108617 | 0.82 | HDAC4 (0.53) | HDAC4HDAC2HDAC8ALDH1A1GAA | |
| SCHEMBL632781 | 0.82 | TAAR1 (0.57) | HDAC4HDAC2HDAC8ALDH1A1GAA | |
| SCHEMBL15427747 | 0.82 | ADRB1 (0.52) | HDAC4HDAC2HDAC8ALDH1A1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 834 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111115966-B | Extraction technology-based underground water pumping treatment system and method | 北京宝沃石油技术有限责任公司 | 2022-04-15 | — | — | CN | claimed |
| CN-111115966-A | Extraction technology-based underground water pumping treatment system and method | 北京宝沃石油技术有限责任公司 | 2020-05-08 | — | — | CN | claimed |
| CN-1448490-A | Coking-suppressing antiscale and application thereof | CHINA PETROLEUM & CHEMICAL (CN) | 2003-10-15 | — | — | CN | claimed |
| CN-122010912-A | Antiviral 1, 3-dioxoindene compounds | 诺华股份有限公司 | 2026-05-12 | — | — | CN | disclosed |
| US-20250188066-A1 | ANTIVIRAL 1,3-DI-OXO-INDENE COMPOUNDS | KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) | 2025-06-12 | — | — | US | disclosed |
| US-12286423-B2 | Antiviral 1,3-di-oxo-indene compounds | NOVARTIS AG (CH) | 2025-04-29 | — | — | US | disclosed |
| US-20240241444-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-07-18 | — | — | US | disclosed |
| US-20240231225-A1 | RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-07-11 | — | — | US | disclosed |
| US-12032288-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-20240219830-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-07-04 | — | — | US | disclosed |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20070088131-A1 | Sulfonate and resist composition | TOISHI KOUJI | 2007-04-19 | — | — | US | disclosed |
| US-20070082289-A1 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-04-12 | — | — | US | disclosed |
| US-20070072121-A1 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-03-29 | — | — | US | disclosed |
| US-20070059639-A1 | Positive resist composition and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-03-15 | — | — | US | disclosed |
| US-7189492-B2 | Photosensitive composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| US-20070042291-A1 | Positive resist composition and a pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-02-22 | — | — | US | disclosed |
| US-7179579-B2 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7179579-B2 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7160669-B2 | Chemical amplification type resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-01-09 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SCO2, CBR1, OXGR1 | HDAC4 1519/4885HDAC2 1680/4885HDAC8 2734/4885 |
| US-20250188066-A1 | ANTIVIRAL 1,3-DI-OXO-INDENE COMPOUNDS | IRF3, EIF2AK2, ZC3HAV1 | HDAC4 1949/4885HDAC2 921/4885HDAC8 1317/4885 |
| US-12286423-B2 | Antiviral 1,3-di-oxo-indene compounds | IRF3, EIF2AK2, ZC3HAV1 | HDAC4 1949/4885HDAC2 921/4885HDAC8 1317/4885 |
| US-20240219830-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | H1-0, HCN3, RER1 | HDAC4 1703/4885HDAC2 777/4885HDAC8 2632/4885 |
| US-12032288-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | RER1, COL1A1, RAD51 | HDAC4 4149/4885HDAC2 4037/4885HDAC8 4521/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.