Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CPT1A | P50416 | 1/20 | 0.40 |
| ▸ | MMP2 | P08253 | 8/20 | 0.39 |
| ▸ | MMP9 | P14780 | 8/20 | 0.39 |
| ▸ | MMP3 | P08254 | 2/20 | 0.39 |
| ▸ | MMP8 | P22894 | 5/20 | 0.38 |
| ▸ | MMP13 | P45452 | 5/20 | 0.38 |
| ▸ | TYMP | P19971 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | CYP19A1 | P11511 | 4/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL531179 | 0.92 | HSD17B10 (0.34) | CPT1AMMP2MMP9MMP3MMP13 | |
| SCHEMBL532319 | 0.78 | MMP9 (0.36) | MMP9MEN1KMT2A | |
| SCHEMBL16053224 | 0.73 | MMP9 (0.46) | CPT1AMMP2MMP9MMP3MMP8 | |
| SCHEMBL531339 | 0.70 | TSHR (0.40) | MMP9MEN1KMT2ATSHR | |
| SCHEMBL18529897 | 0.68 | CYP19A1 (0.44) | CPT1ATSHRCYP19A1 | |
| SCHEMBL11534423 | 0.67 | MMP2 (0.47) | MMP2MMP9MMP3MMP8MMP13 | |
| SCHEMBL11484713 | 0.67 | MMP2 (0.47) | MMP2MMP9MMP3MMP8MMP13 | |
| SCHEMBL10407006 | 0.67 | MMP2 (0.47) | MMP2MMP9MMP3MMP8MMP13 | |
| SCHEMBL5450754 | 0.65 | MMP9 (0.67) | MMP2MMP9MMP3MMP8MMP13 | |
| SCHEMBL468545 | 0.65 | MMP9 (0.67) | MMP2MMP9MMP3MMP8MMP13 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2389612-A1 | A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING | AZ Electronic Materials USA Corp. (US) | 2011-11-30 | — | — | EP | disclosed |
| WO-2010084372-A1 | A PHOTORESIST IMAGE-FORMING PROCESS USING DOUBLE PATTERNING | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-07-29 | — | — | WO | disclosed |
| EP-2158277-A2 | A COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN COMPRISING A LACTEM | AZ Electronic Materials USA Corp. (US) | 2010-03-03 | — | — | EP | disclosed |
| WO-2008122884-A2 | A COMPOSITION FOR COATING OVER A PHOTORESIST PATTERN COMPRISING A LACTEM | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-10-16 | — | — | WO | disclosed |