SCHEMBL17461701

SCHEMBL17461701

C=C(C)C(=O)OCCNC(=O)c1ccc(S(=O)(=O)ON2C(=O)c3cccc4cccc(c34)C2=O)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 9/20 0.53
▸ KDM4E B2RXH2 7/20 0.53
▸ HPGD P15428 6/20 0.53
▸ MAPT P10636 5/20 0.50
▸ KMT2A Q03164 5/20 0.50
▸ MEN1 O00255 4/20 0.50
▸ HTT P42858 1/20 0.50
▸ LMNA P02545 1/20 0.50
▸ THRB P10828 1/20 0.50
▸ VDR P11473 2/20 0.40
▸ POLB P06746 1/20 0.40
▸ L3MBTL1 Q9Y468 1/20 0.40
▸ F2 P00734 1/20 0.40
▸ TDP1 Q9NUW8 1/20 0.36
▸ HEXA P06865 1/20 0.36
▸ HEXB P07686 1/20 0.36
▸ CA2 P00918 2/20 0.36
▸ NPC1 O15118 1/20 0.36
▸ RAB9A P51151 1/20 0.36
▸ SMN1; SMN2 Q16637 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21325680 0.85 KDM4E (0.61) ALDH1A1KDM4EHPGDMAPTKMT2A
SCHEMBL17461711 0.83 KDM4E (0.41) ALDH1A1KDM4EHPGDMAPTKMT2A
SCHEMBL10409833 0.80 KDM4E (0.52) ALDH1A1KDM4EHPGDMAPTKMT2A
SCHEMBL17461330 0.79 KDM4E (0.39) ALDH1A1KDM4EHPGDMAPTKMT2A
SCHEMBL10409879 0.74 KDM4E (0.75) ALDH1A1KDM4EHPGDMAPTKMT2A
SCHEMBL17447746 0.73 CA2 (0.47) ALDH1A1KDM4EHPGDKMT2AMEN1
SCHEMBL10410862 0.73 KDM4E (0.72) ALDH1A1KDM4EHPGDMAPTKMT2A
SCHEMBL24634086 0.73 RAB9A (0.56) ALDH1A1KDM4EHPGDMAPTKMT2A
SCHEMBL13495448 0.72 KDM4E (0.42) ALDH1A1KDM4EHPGDMAPTKMT2A
SCHEMBL17461332 0.72 KDM4E (0.54) ALDH1A1KDM4EHPGDMAPTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9244345-B1 Non-ionic photo-acid generating polymers for resist applications INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2016-01-26 — — US disclosed
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