SCHEMBL17469412

SCHEMBL17469412

CC1(c2ccncc2)CCC1

nearest known ligand 0.41

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 1/20 0.41
CYP19A1 P11511 9/20 0.36
LMNA P02545 3/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
GRM5 P41594 1/20 0.35
LATS1 O95835 2/20 0.33
LATS2 Q9NRM7 2/20 0.33
GAA P10253 1/20 0.33
CRHBP P24387 1/20 0.33
CRHR2 Q13324 1/20 0.33
CHKA P35790 1/20 0.33
SIGMAR1 Q99720 1/20 0.33
MAPT P10636 1/20 0.33
HSD11B1 P28845 1/20 0.33
USP2 O75604 1/20 0.33
CYP2D6 P10635 1/20 0.33
CYP2C9 P11712 1/20 0.33
TSHR P16473 1/20 0.33
HSD17B10 Q99714 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12586113 0.95 EPHX2 (0.41) EPHX2CYP19A1LMNAL3MBTL1GRM5
SCHEMBL20033743 0.93 CYP19A1 (0.41) EPHX2CYP19A1LMNAL3MBTL1GRM5
SCHEMBL14943252 0.90 CYP19A1 (0.38) EPHX2CYP19A1LMNAL3MBTL1GRM5
SCHEMBL4306573 0.75 ESR1 (0.46) CYP19A1LMNAL3MBTL1CHKASIGMAR1
SCHEMBL353050 0.75 OPRL1 (0.46)
SCHEMBL16590522 0.74 ALDH1A1 (0.40) EPHX2LMNAMAPTTSHRHSD17B10
SCHEMBL10602015 0.74 ESR1 (0.42) L3MBTL1
SCHEMBL8297897 0.73 MAOB (0.40) L3MBTL1MAPTHSD11B1
SCHEMBL436499 0.71 SLC6A4 (0.46) EPHX2LMNAMAPTHSD11B1TSHR
SCHEMBL19779259 0.71 VNN1 (0.31) HSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11709427-B2 Positive resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-25 US disclosed
US-11709427-B2 Positive resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-25 US disclosed
US-20210247694-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-08-12 US disclosed
US-20160024004-A1 NOVEL ANTIVIRAL AGENTS AGAINST HBV INFECTION NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT 2016-01-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160024004-A1 NOVEL ANTIVIRAL AGENTS AGAINST HBV INFECTION HAVCR2, EIF2AK2, NR1H4 EPHX2 1915/4885CYP19A1 990/4885LMNA 1478/4885
US-11709427-B2 Positive resist composition and pattern forming process EWSR1, PARG, VIM EPHX2 4575/4885CYP19A1 3736/4885LMNA 2542/4885
US-20210247694-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS EWSR1, PARG, VIM EPHX2 4575/4885CYP19A1 3736/4885LMNA 2542/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.