SCHEMBL17515669

SCHEMBL17515669

CCC(C)c1cccc(Oc2c(F)c(F)c(F)c(S(=O)(=O)O)c2F)c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA12 O43570 1/20 0.40
▸ CA1 P00915 1/20 0.40
▸ CA2 P00918 1/20 0.40
▸ CA7 P43166 1/20 0.40
▸ CA13 Q8N1Q1 1/20 0.40
▸ HDAC4 P56524 1/20 0.40
▸ HDAC2 Q92769 1/20 0.40
▸ HDAC8 Q9BY41 1/20 0.40
▸ MAPT P10636 4/20 0.39
▸ MEN1 O00255 4/20 0.39
▸ KMT2A Q03164 4/20 0.39
▸ LMNA P02545 2/20 0.39
▸ HTT P42858 1/20 0.39
▸ SMN1; SMN2 Q16637 1/20 0.39
▸ NPSR1 Q6W5P4 1/20 0.39
▸ POLB P06746 2/20 0.37
▸ HSP90AA1 P07900 1/20 0.37
▸ PTGS1 P23219 1/20 0.36
▸ KDM4E B2RXH2 2/20 0.36
▸ ALOX5 P09917 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16683133 0.98 CA12 (0.42) CA12CA1CA2CA7CA13
SCHEMBL16683145 0.86 ALDH1A1 (0.45) CA12CA1CA2CA7CA13
SCHEMBL16683138 0.84 ABCB11 (0.41) CA12CA1CA2CA7CA13
SCHEMBL16081291 0.84 ALDH1A1 (0.47) CA12CA1CA2CA7CA13
SCHEMBL16683132 0.77 L3MBTL1 (0.34) HDAC4HDAC2HDAC8MAPTLMNA
SCHEMBL16591118 0.76 NPC1 (0.46) CA12CA1CA2CA7MEN1
SCHEMBL16591139 0.76 NPC1 (0.39) MAPTHSP90AA1ALOX5ALDH1A1TSHR
SCHEMBL16865900 0.75 ALDH1A1 (0.32) CA12CA1CA2CA7CA13
SCHEMBL16865903 0.74 LMNA (0.34) CA12CA1CA2CA7CA13
SCHEMBL16591097 0.73 ALDH1A1 (0.47) MAPTMEN1KMT2ALMNASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10031419-B2 Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device FUJIFILM CORPORATION (JP) 2018-07-24 — — US disclosed
US-20160048075-A1 PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THESE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-02-18 — — US disclosed
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