SCHEMBL17517801

SCHEMBL17517801

C=C(C)N(/C=C\C)CCCC

nearest known ligand 0.31

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
MMP1 P03956 1/20 0.31
MMP2 P08253 1/20 0.31
MMP3 P08254 1/20 0.31
MMP8 P22894 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7059374 0.79 CA12 (0.38) MMP1MMP2MMP3MMP8
SCHEMBL7059370 0.79 CA12 (0.38) MMP1MMP2MMP3MMP8
SCHEMBL25126239 0.71 FAAH (0.34)
SCHEMBL6940701 0.69 CA12 (0.33) MMP1MMP2MMP3MMP8
SCHEMBL20924110 0.68 ALDH1A1 (0.32)
SCHEMBL23204984 0.68
SCHEMBL22157501 0.67 DNM1 (0.32)
SCHEMBL20686882 0.67 CA12 (0.46) MMP1MMP2MMP3MMP8
SCHEMBL22157505 0.67 DNM1 (0.32)
SCHEMBL13256216 0.67 DNM1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9651863-B2 Pattern forming method, active light sensitive or radiation sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2017-05-16 US disclosed
US-20160041465-A1 PATTERN FORMING METHOD, ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-02-11 US disclosed