SCHEMBL17545704

SCHEMBL17545704

C=Cc1ccc(S(=O)(=O)NS(=O)(=O)C(F)(F)C(=O)OCC23CC4CC(CC(C4)C2)C3)cc1

nearest known ligand 0.36

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ CA2 P00918 1/20 0.36
▸ SCN9A Q15858 8/20 0.36
▸ CA12 O43570 1/20 0.34
▸ CA9 Q16790 1/20 0.34
▸ ALDH1A1 P00352 4/20 0.34
▸ LMNA P02545 1/20 0.33
▸ KMT2A Q03164 2/20 0.33
▸ RAB9A P51151 1/20 0.33
▸ MEN1 O00255 1/20 0.33
▸ L3MBTL1 Q9Y468 1/20 0.33
▸ HDAC3 O15379 1/20 0.32
▸ HDAC1 Q13547 1/20 0.32
▸ HDAC2 Q92769 1/20 0.32
▸ HDAC6 Q9UBN7 1/20 0.32
▸ EPHX2 P34913 1/20 0.32
▸ SCN5A Q14524 1/20 0.32
▸ TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17545705 0.91 SCN9A (0.37) CA2SCN9AALDH1A1
SCHEMBL17545714 0.85 KMT2A (0.42) ALDH1A1LMNAKMT2AMEN1
SCHEMBL17545698 0.80 SCN9A (0.35) CA2SCN9ACA12CA9ALDH1A1
SCHEMBL17522544 0.80 ALDH1A1 (0.47) CA2SCN9ACA12CA9ALDH1A1
SCHEMBL17545715 0.78 TSHR (0.38) ALDH1A1LMNAEPHX2TDP1
SCHEMBL17545689 0.78 KMT2A (0.41) ALDH1A1LMNAKMT2ATDP1
SCHEMBL18211284 0.77 ALDH1A1 (0.43) CA2SCN9ACA12CA9ALDH1A1
SCHEMBL17545688 0.77 TDP1 (0.41) CA2KMT2AMEN1L3MBTL1HDAC3
SCHEMBL2742127 0.76 ALDH1A1 (0.46) CA2SCN9ACA12CA9ALDH1A1
SCHEMBL2880584 0.74 SCN9A (0.33) SCN9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9599897-B2 Salt, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-03-21 — — US disclosed
US-20160052877-A1 SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-02-25 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160052877-A1 SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN RER1, AFF1, FRG1 CA2 798/4885SCN9A 1125/4885CA12 2230/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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