Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 1/20 | 0.33 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.33 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1697254 | 0.86 | CYP17A1 (0.35) | CYP17A1CYP19A1 | |
| SCHEMBL26061830 | 0.82 | CYP17A1 (0.33) | CYP17A1CYP19A1 | |
| SCHEMBL1697258 | 0.81 | CYP17A1 (0.34) | CYP17A1CYP19A1 | |
| SCHEMBL14651524 | 0.81 | CYP17A1 (0.30) | CYP17A1CYP19A1 | |
| SCHEMBL24068236 | 0.80 | CYP17A1 (0.30) | CYP17A1CYP19A1 | |
| SCHEMBL26544555 | 0.80 | HSD11B1 (0.31) | CYP17A1CYP19A1HSD11B1 | |
| SCHEMBL1704343 | 0.80 | CYP17A1 (0.30) | CYP17A1CYP19A1 | |
| SCHEMBL106919 | 0.80 | CYP19A1 (0.46) | CYP17A1CYP19A1 | |
| SCHEMBL14258838 | 0.79 | CYP19A1 (0.37) | CYP17A1CYP19A1HSD11B1 | |
| SCHEMBL18253501 | 0.79 | CYP19A1 (0.37) | CYP17A1CYP19A1HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9644056-B2 | Compound, resin and photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-05-09 | — | — | US | disclosed |
| US-9638996-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-05-02 | — | — | US | disclosed |
| US-20160237190-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-18 | — | — | US | disclosed |
| US-20160062234-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-03-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160237190-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | HAX1, F11, RXRA | CYP17A1 1537/4885CYP19A1 263/4885HSD11B1 780/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.