SCHEMBL17548736

SCHEMBL17548736

CC(F)(F)C(=O)OC12CC3CC(C1)C1(SCC(COC(=O)C45CC6CC(CC(O)(C6)C4)C5)(COC(=O)C45CC6CC(CC(O)(C6)C4)C5)CS1)C(C3)C2

nearest known ligand 0.39

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.39
NPC1 O15118 5/20 0.36
RAB9A P51151 5/20 0.36
L3MBTL1 Q9Y468 2/20 0.35
ABL1 P00519 1/20 0.34
TSHR P16473 1/20 0.34
RIN1 Q13671 1/20 0.34
NPSR1 Q6W5P4 2/20 0.33
LMNA P02545 1/20 0.32
USP2 O75604 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
POLB P06746 1/20 0.31
CYP17A1 P05093 1/20 0.30
CYP19A1 P11511 1/20 0.30
HSD11B1 P28845 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17548724 0.92 ALDH1A1 (0.32) ALDH1A1NPSR1CYP17A1CYP19A1
SCHEMBL17550513 0.90 ALDH1A1 (0.38) ALDH1A1NPC1RAB9AL3MBTL1ABL1
SCHEMBL17548712 0.85 ALDH1A1 (0.39) ALDH1A1NPC1RAB9AL3MBTL1ABL1
SCHEMBL17548735 0.84 ALDH1A1 (0.41) ALDH1A1NPC1RAB9AL3MBTL1ABL1
SCHEMBL17548729 0.84 TSHR (0.35) TSHRNPSR1
SCHEMBL17548728 0.82 ALDH1A1 (0.38) ALDH1A1NPC1RAB9AL3MBTL1ABL1
SCHEMBL17548730 0.82
SCHEMBL17550533 0.81 MEN1 (0.31) ALDH1A1NPSR1
SCHEMBL16941859 0.80
SCHEMBL25494533 0.79 ALDH1A1 (0.38) ALDH1A1NPC1RAB9AL3MBTL1ABL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9760005-B2 Salt, acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-09-12 US disclosed
US-20160062233-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-03-03 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160062233-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN XDH, HAX1, MLX ALDH1A1 2530/4885NPC1 3787/4885RAB9A 2596/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.