Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | APP | P05067 | 7/20 | 0.74 |
| ▸ | MAPT | P10636 | 2/20 | 0.61 |
| ▸ | CA12 | O43570 | 1/20 | 0.43 |
| ▸ | CA1 | P00915 | 1/20 | 0.43 |
| ▸ | CA2 | P00918 | 1/20 | 0.43 |
| ▸ | CA4 | P22748 | 1/20 | 0.43 |
| ▸ | CA9 | Q16790 | 1/20 | 0.43 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 2/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.42 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.40 |
| ▸ | PIK3CA | P42336 | 1/20 | 0.39 |
| ▸ | MTOR | P42345 | 1/20 | 0.39 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL106193 | 0.92 | — | — | |
| Hydrochloric Acid SCHEMBL2015334 | 0.89 | APP (0.55) | APPMAPTCA12CA1CA2 | |
| SCHEMBL9611200 | 0.86 | APP (1.00) | APPMAPTCA14MEN1KMT2A | |
| SCHEMBL864945 | 0.86 | APP (1.00) | APPMAPTCA14MEN1KMT2A | |
| SCHEMBL1306534 | 0.86 | HDAC8 (0.50) | APPMAPTCA12CA1CA2 | |
| SCHEMBL9659495 | 0.84 | CYP3A4 (0.58) | APPMAPTCA12CA1CA2 | |
| SCHEMBL21903463 | 0.80 | APP (0.88) | APPMAPTCA14MEN1KMT2A | |
| SCHEMBL13625381 | 0.80 | APP (0.47) | APPMAPTCA12CA1CA2 | |
| SCHEMBL9658226 | 0.78 | ALDH1A1 (0.64) | APPMAPTMEN1KMT2AALDH1A1 | |
| SCHEMBL5488179 | 0.78 | CYP3A4 (0.64) | APPMAPTCA12CA1CA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117186403-B | Negative photosensitive resin, resin composition, and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-04-02 | — | — | CN | claimed |
| CN-116836388-B | Positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-12-15 | — | — | CN | claimed |
| CN-117186403-A | Negative photosensitive resin, resin composition, and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-12-08 | — | — | CN | claimed |
| CN-116836388-A | Positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-10-03 | — | — | CN | claimed |
| CN-116149140-B | Positive photosensitive resin composition with high chemical resistance and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-07-14 | — | — | CN | claimed |
| CN-116068852-B | Positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-07-14 | — | — | CN | claimed |
| CN-116149140-A | Positive photosensitive resin composition with high chemical resistance and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-05-23 | — | — | CN | claimed |
| CN-116068852-A | Positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-05-05 | — | — | CN | claimed |
| CN-114995060-B | Negative photosensitive resin composition capable of being cured at low temperature and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-11-01 | — | — | CN | claimed |
| CN-114995061-B | Low-water-absorption positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-11-01 | — | — | CN | claimed |
| CN-115220305-A | Positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-10-21 | — | — | CN | claimed |
| CN-114995060-A | Negative photosensitive resin composition capable of being cured at low temperature and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-09-02 | — | — | CN | claimed |
| CN-114995061-A | Low-water-absorption positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-09-02 | — | — | CN | claimed |
| CN-117186403-B | Negative photosensitive resin, resin composition, and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-04-02 | — | — | CN | disclosed |
| CN-116836388-B | Positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-12-15 | — | — | CN | disclosed |
| CN-117186403-A | Negative photosensitive resin, resin composition, and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-12-08 | — | — | CN | disclosed |
| US-8158203-B2 | Methods of attaching or grafting carbon nanotubes to silicon surfaces and composite structures derived therefrom | WILLIAM MARSH RICE UNIVERSITY (US) | 2012-04-17 | — | — | US | disclosed |
| US-8158203-B2 | Methods of attaching or grafting carbon nanotubes to silicon surfaces and composite structures derived therefrom | WILLIAM MARSH RICE UNIVERSITY (US) | 2012-04-17 | — | — | US | disclosed |
| US-20090042136-A1 | Carbon Nanotube-Silicon Composite Structures and Methods for Making Same | NATIONAL SCIENCE FOUNDATION | 2009-02-12 | — | — | US | disclosed |
| WO-2005114708-A2 | CARBON NANOTUBE-SILICON COMPOSITE STRUCTURES AND METHODS FOR MAKING SAME | WILLIAM MARSH RICE UNIVERSITY (US) | 2005-12-01 | — | — | WO | disclosed |