Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | THRB | P10828 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15730952 | 0.91 | TSHR (0.45) | TSHRALDH1A1THRB | |
| SCHEMBL9323497 | 0.85 | TSHR (0.46) | TSHRALDH1A1THRBTDP1HSD17B10 | |
| SCHEMBL5249209 | 0.85 | TSHR (0.46) | TSHRALDH1A1THRBTDP1HSD17B10 | |
| SCHEMBL6695785 | 0.83 | TSHR (0.45) | TSHRALDH1A1THRBTDP1 | |
| SCHEMBL9842552 | 0.83 | TSHR (0.45) | TSHRALDH1A1THRBTDP1 | |
| SCHEMBL526912 | 0.83 | TSHR (0.45) | TSHRALDH1A1THRBTDP1 | |
| SCHEMBL28882760 | 0.82 | TSHR (0.41) | TSHRALDH1A1THRB | |
| Ammonia Solution, Strong SCHEMBL18138980 | 0.81 | TSHR (0.43) | TSHRALDH1A1THRBTDP1 | |
| SCHEMBL3987277 | 0.81 | TSHR (0.43) | TSHRALDH1A1THRBTDP1 | |
| Methyl Alcohol SCHEMBL28174876 | 0.81 | TSHR (0.43) | TSHRALDH1A1THRBTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2993520-B1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2017-03-08 | — | — | EP | disclosed |
| US-9458144-B2 | Monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-10-04 | — | — | US | disclosed |
| US-9458144-B2 | Monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-10-04 | — | — | US | disclosed |
| US-20160152755-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-02 | — | — | US | disclosed |
| US-20160152755-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-02 | — | — | US | disclosed |
| US-9346775-B2 | Method for manufactruring β-(meth)acryloyloxy-γ-butyrolactones | JNC CORPORATION (JP) | 2016-05-24 | — | — | US | disclosed |
| EP-2993520-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2016-03-09 | — | — | EP | disclosed |
| US-20150322027-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-12 | — | — | US | disclosed |
| US-20150322027-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-12 | — | — | US | disclosed |
| US-20150126753-A1 | METHOD FOR MANUFACTRURING BETA-(METH)ACRYLOYLOXY-GAMMA-BUTYROLACTONES | JNC CORPORATION (JP) | 2015-05-07 | — | — | US | disclosed |
| US-8742038-B2 | Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-06-03 | — | — | US | disclosed |
| EP-2441809-A1 | ANTIFOULING COATING COMPOSITION, ANTIFOULING COATING FILM FORMED FROM THE COMPOSITION, COATED OBJECT HAVING THE COATING FILM ON SURFACE, AND METHOD OF ANTIFOULING TREATMENT BY FORMING THE COATING FILM | Nitto Kasei Co., Ltd. (JP) | 2012-04-18 | — | — | EP | disclosed |
| US-20120010342-A1 | ANTIFOULING COATING COMPOSITION, ANTIFOULING COATING FILM FORMED BY USE OF THE COMPOSITION, COATED OBJECT HAVING THE COATING FILM THEREON, AND METHOD OF ANTIFOULING TREATMENT BY FORMING THE COATING FILM | NITTO KASEI CO., LTD. (JP) | 2012-01-12 | — | — | US | disclosed |
| US-20120010342-A1 | ANTIFOULING COATING COMPOSITION, ANTIFOULING COATING FILM FORMED BY USE OF THE COMPOSITION, COATED OBJECT HAVING THE COATING FILM THEREON, AND METHOD OF ANTIFOULING TREATMENT BY FORMING THE COATING FILM | NITTO KASEI CO., LTD. (JP) | 2012-01-12 | — | — | US | disclosed |
| US-20090197204-A1 | RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-08-06 | — | — | US | disclosed |
| US-6024895-A | COMPRISING SOLUBLE, ELECTRICALLY CONDUCTING POLYMER HAVING SULFONIC ACID GROUP AND/OR CARBOXYL GROUP AND THERMALLY CROSS-LINKABLE OR ULTRAVIOLET- OR ELECTRON BEAM-CROSS-LINKABLE RESIN OR PAINT | MITSUBISHI RAYON CO., LTD. (JP) | 2000-02-15 | — | — | US | disclosed |
| EP-0844284-A1 | CROSS-LINKABLE CONDUCTIVE COMPOSITION, CONDUCTOR, AND PROCESS FOR FORMING THE SAME | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1998-05-27 | — | — | EP | disclosed |
| EP-0837112-A2 | Cross-linkable, electrically conductive composition, electric conductor and process for forming the same | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1998-04-22 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150126753-A1 | METHOD FOR MANUFACTRURING BETA-(METH)ACRYLOYLOXY-GAMMA-BUTYROLACTONES | MCCC2, ACR, MMAB | TSHR 4441/4885ALDH1A1 414/4885THRB 604/4885 |
| US-20150322027-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | ELL, RPS17, EEF1A1 | TSHR 4770/4885ALDH1A1 1187/4885THRB 4718/4885 |
| US-20090197204-A1 | RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING COMPOUND | RER1, FRG1, AFF1 | TSHR 2238/4885ALDH1A1 2326/4885THRB 2484/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.