SCHEMBL28047343

SCHEMBL28047343

Cc1cc(-c2cc(C)c(O)c(C)c2)c(C=O)c(-c2cc(C)c(O)c(C)c2)c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA1 P00915 1/20 0.48
▸ CA2 P00918 1/20 0.48
▸ ERN1 O75460 3/20 0.45
▸ CYP3A4 P08684 4/20 0.40
▸ MAPT P10636 3/20 0.40
▸ ALB P02768 2/20 0.38
▸ KDM4E B2RXH2 2/20 0.36
▸ ALDH1A1 P00352 2/20 0.36
▸ LMNA P02545 2/20 0.36
▸ GAA P10253 2/20 0.36
▸ CYP2C9 P11712 4/20 0.36
▸ CYP1A2 P05177 3/20 0.36
▸ CYP2D6 P10635 2/20 0.36
▸ ALOX5 P09917 2/20 0.36
▸ PTGS1 P23219 2/20 0.36
▸ PTGS2 P35354 2/20 0.36
▸ CYP2B6 P20813 1/20 0.36
▸ USP2 O75604 2/20 0.35
▸ CYP2C19 P33261 2/20 0.34
▸ EEF2K O00418 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28047261 0.82 ERN1 (0.47) CA1CA2ERN1CYP3A4MAPT
SCHEMBL10913187 0.76 ERN1 (0.34) CA1CA2ERN1CYP3A4MAPT
SCHEMBL17557795 0.73 CA1 (0.48) CA1CA2ERN1CYP3A4CYP2C9
Formic Acid SCHEMBL15532423 0.72 ALDH1A1 (0.52) CA1CA2ERN1CYP3A4MAPT
SCHEMBL28047266 0.72 CA1 (0.46) CA1CA2ERN1CYP3A4ALB
SCHEMBL22500364 0.69 CA1 (0.54) CA1CA2MAPTKDM4EALDH1A1
SCHEMBL9229319 0.69 CA2 (0.78) CA1CA2ERN1CYP3A4MAPT
SCHEMBL220910 0.68 CA1 (1.00) CA1CA2CYP3A4MAPTKDM4E
SCHEMBL36529 0.68 ALDH1A1 (0.65) CA1CA2ERN1CYP3A4MAPT
SCHEMBL22804025 0.68 CA1 (1.00) CA1CA2CYP3A4MAPTKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105209974-A Novolac-resin-containing composition for forming resist underlayer film using bisphenol aldehyde NISSAN CHEMICAL IND LTD 2015-12-30 — — CN disclosed
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