⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17886857 | 0.80 | — | — | |
| SCHEMBL21214355 | 0.78 | CES2 (0.43) | — | |
| SCHEMBL17721280 | 0.78 | — | — | |
| SCHEMBL30358256 | 0.78 | FAAH (0.38) | — | |
| SCHEMBL20931107 | 0.78 | ALDH1A1 (0.42) | — | |
| SCHEMBL14949720 | 0.76 | TSHR (0.35) | — | |
| SCHEMBL14707552 | 0.72 | — | — | |
| SCHEMBL19014327 | 0.71 | TDP1 (0.41) | — | |
| SCHEMBL10053095 | 0.71 | — | — | |
| SCHEMBL12019810 | 0.70 | ALDH1A1 (0.50) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9523912-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound | FUJIFILM CORPORATION (JP) | 2016-12-20 | — | — | US | disclosed |
| US-20160070167-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND | FUJIFILM CORPORATION (JP) | 2016-03-10 | — | — | US | disclosed |