Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PPARG | P37231 | 1/20 | 0.40 |
| ▸ | PPARD | Q03181 | 1/20 | 0.40 |
| ▸ | PPARA | Q07869 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | TP53 | P04637 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 2/20 | 0.37 |
| ▸ | MEN1 | O00255 | 6/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.37 |
| ▸ | NPC1 | O15118 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.37 |
| ▸ | CASP3 | P42574 | 1/20 | 0.36 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.36 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.36 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.36 |
| ▸ | MTNR1B | P49286 | 2/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.36 |
| ▸ | ALPL | P05186 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1764456 | 0.92 | PPARG (0.43) | PPARGPPARDPPARAHTTTP53 | |
| SCHEMBL1765016 | 0.86 | HTT (0.42) | PPARGPPARDPPARAHTTMEN1 | |
| Sulfuric Acid SCHEMBL1123017 | 0.84 | PPARG (0.44) | PPARGPPARDPPARAHTTMEN1 | |
| Sulfuric Acid SCHEMBL6929881 | 0.83 | PPARG (0.43) | PPARGPPARDPPARAHTTMEN1 | |
| Sulfuric Acid SCHEMBL5698877 | 0.81 | MEN1 (0.45) | PPARGPPARDPPARAHTTMEN1 | |
| SCHEMBL5854747 | 0.81 | CTSV (0.40) | PPARGPPARDPPARAHTTMEN1 | |
| Sulfuric Acid SCHEMBL6357625 | 0.79 | MEN1 (0.47) | PPARGPPARDPPARAMEN1KMT2A | |
| Amylosulfuric Acid SCHEMBL5854420 | 0.79 | PPARG (0.41) | PPARGPPARDPPARAMEN1KMT2A | |
| SCHEMBL92096 | 0.79 | MEN1 (0.47) | PPARGPPARDPPARANPSR1RAB9A | |
| Trifluoromethanesulfonic Acid SCHEMBL11060685 | 0.79 | PPARG (0.41) | PPARGPPARDPPARAHTTMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 80 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11909031-B2 | Film electrode, resin layer forming ink, inorganic layer forming ink, and electrode printing apparatus | RICOH COMPANY, LTD. (JP) | 2024-02-20 | — | — | US | disclosed |
| US-20230091130-A1 | FILM ELECTRODE, RESIN LAYER FORMING INK, INORGANIC LAYER FORMING INK, AND ELECTRODE PRINTING APPARATUS | RICOH COMPANY, LTD. (JP) | 2023-03-23 | — | — | US | disclosed |
| US-11588147-B2 | Film electrode, resin layer forming ink, inorganic layer forming ink, and electrode printing apparatus | RICOH COMPANY, LTD. (JP) | 2023-02-21 | — | — | US | disclosed |
| US-20200119333-A1 | FILM ELECTRODE, RESIN LAYER FORMING INK, INORGANIC LAYER FORMING INK, AND ELECTRODE PRINTING APPARATUS | RICOH COMPANY, LTD. (JP) | 2020-04-16 | — | — | US | disclosed |
| WO-2018164076-A1 | FILM ELECTRODE, RESIN LAYER FORMING INK, INORGANIC LAYER FORMING INK, AND ELECTRODE PRINTING APPARATUS | RICOH COMPANY, LTD. (JP) | 2018-09-13 | — | — | WO | disclosed |
| US-9229136-B2 | Microlens array unit and image processing apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2016-01-05 | — | — | US | disclosed |
| US-8976422-B2 | Image forming apparatus, lens array and forming method of same | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2015-03-10 | — | — | US | disclosed |
| US-20140084141-A1 | LIGHT BLOCKING INK, MICROLENS ARRAY UNIT, IMAGE PROCESSING APPARATUS | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2014-03-27 | — | — | US | disclosed |
| US-20130235451-A1 | LENS ARRAY, IMAGE FORMING DEVICE AND METHOD FOR MANUFACTURING LENS ARRAY | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2013-09-12 | — | — | US | disclosed |
| US-20130235434-A1 | IMAGE FORMING APPARATUS, LENS ARRAY AND FORMING METHOD OF SAME | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2013-09-12 | — | — | US | disclosed |
| US-6660450-B2 | Acrylic ester polymer having pendant adamantane rings with oxygenated substitution; ultraviolet light transparency; dry etching resistance | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-12-09 | — | — | US | disclosed |
| US-20030149225-A1 | Resin useful for resist, resist composition and pattern forming process using the same | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-08-07 | — | — | US | disclosed |
| US-6541597-B2 | Resist resin having in its structure a bridged bond containing aliphatic ring; pattern excellent in transparency against short wavelength light and dry-etching resistance can be formed by alkali development with high resolution. | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-04-01 | — | — | US | disclosed |
| US-20020098441-A1 | Resin useful for resist, resist composition and pattern forming process using the same | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-07-25 | — | — | US | disclosed |
| US-6410748-B1 | Alicycli c group-containing monomer | KABUSHIKI KAISHA TOSHIBA (JP) | 2002-06-25 | — | — | US | disclosed |
| US-6303266-B1 | FOR PATTERN HAVING TRANSPARENCY AGAINST SHORT-WAVELENGTH LIGHT AND DRY-ETCHING RESISTANCE CAN BE FORMED BY ALKALI DEVELOPMENT WITH HIGH RESOLUTION | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-10-16 | — | — | US | disclosed |
| US-6291129-B1 | LIGHT SENSITIVE ELEMENT WITH UNSATURATED POLYMERS | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-09-18 | — | — | US | disclosed |
| US-6071670-A | PHOTORESIST RESIN COMPRISING PHOTOACID GENERATING COMPOUND AND AN ACID HYDROLYZABLE OLIGOMER HAVING ALICYCLIC OR POLYCONDENSED AROMATIC BACKBONE; ALKALI DEVELOPMENT WITH HIGH RESOLUTION, DRY ETCH RESISTANCE | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-06-06 | — | — | US | disclosed |
| US-6060207-A | LOW IN ABSORPTION OF A LIGHT SOURCE OF SHORT WAVELENGTH AND EXCELLENT IN DRY ETCH RESISTANCE; COMPRISES A COMPOUND HAVING A TERPENOID SKELETON | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-05-09 | — | — | US | disclosed |
| US-5932391-A | CONTAINING AN ACYCLIC COMPOUND WHICH IS A VINYL POLYMERBEING LIGHT ABSORBENT | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-08-03 | — | — | US | disclosed |