SCHEMBL1765857

SCHEMBL1765857

CCO[Si](OCC)(OCC)C(C)c1ccccc1O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.53
GABRA1 P14867 2/20 0.48
GABRB2 P47870 2/20 0.48
POLB P06746 2/20 0.40
PTPN2 P17706 1/20 0.36
PTPN1 P18031 1/20 0.36
CA1 P00915 2/20 0.34
CA2 P00918 2/20 0.34
CA12 O43570 1/20 0.34
CA7 P43166 1/20 0.34
CA9 Q16790 1/20 0.34
CA14 Q9ULX7 1/20 0.34
HPGD P15428 3/20 0.34
MAPT P10636 3/20 0.34
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
PTPN9 P43378 1/20 0.33
MAPKAPK2 P49137 1/20 0.33
GAA P10253 3/20 0.33
KDM4E B2RXH2 3/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL562866 0.87 TSHR (0.38) TSHRGABRA1GABRB2NISCHALDH1A1
Benzene SCHEMBL28228273 0.85 TSHR (0.36) TSHRGABRA1GABRB2HPGDKDM4E
SCHEMBL1765958 0.79 GABRA1 (0.54) TSHRGABRA1GABRB2POLBCA1
SCHEMBL8087531 0.79 ALDH1A1 (0.44) TSHRPOLBHPGDMAPTMEN1
SCHEMBL28332142 0.79 CA1 (0.41) TSHRPOLBCA1CA2CA12
SCHEMBL574617 0.77 TAAR1 (0.39) GABRA1GABRB2POLBMAPTLMNA
SCHEMBL2520763 0.76 IDO1 (0.33) TSHRMAPTALDH1A1MPO
SCHEMBL2526800 0.76 SLC6A2 (0.31) TSHRMAPTSLC6A2ALDH1A1MPO
SCHEMBL3305911 0.75 ALDH1A1 (0.32) TSHRALDH1A1
SCHEMBL574403 0.74 ESR1 (0.33) HPGDMAPTGAALMNACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10474032-B2 Coating compositions ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-11-12 US disclosed
US-9437431-B2 Electronic device manufacture ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2016-09-06 US disclosed
EP-1720075-B1 Coating compositions ROHM & HAAS ELECT MAT (US) 2016-03-02 EP disclosed
US-20150072290-A1 COATING COMPOSITIONS ROHM AND HAAS ELECTRONIC MATERIALS LLC 2015-03-12 US disclosed
US-8911927-B2 Compositions and processes for immersion lithography ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-12-16 US disclosed
US-8889344-B2 Coating compositions ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-11-18 US disclosed
US-8263316-B2 Electronic device manufacture ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2012-09-11 US disclosed
US-20110123937-A1 COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-05-26 US disclosed
US-7781141-B2 Compositions and processes for immersion lithography ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2010-08-24 US disclosed
US-7723850-B2 Electronic devices having air gaps ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2010-05-25 US disclosed
US-20050020068-A1 Plating method ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. (US) 2005-01-27 US disclosed
EP-1479793-A2 Plating method Rohm and Haas Electronic Materials, L.L.C. (US) 2004-11-24 EP disclosed
US-20040137728-A1 Air gap formation SHIPLEY COMPANY, L.L.C. (US) 2004-07-15 US disclosed
US-20040130032-A1 Electronic device manufacture SHIPLEY COMPANY, L.L.C. 2004-07-08 US disclosed
US-20040109950-A1 Dielectric materials SHIPLEY COMPANY, L.L.C. 2004-06-10 US disclosed
EP-1403925-A2 Dielectric material for electronic devices Shipley Co. L.L.C. (US) 2004-03-31 EP disclosed
US-20040052948-A1 Electronic device manufacture SHIPLEY COMPANY, L.L.C. 2004-03-18 US disclosed
EP-1398831-A2 Air gaps formation Shipley Co. L.L.C. (US) 2004-03-17 EP disclosed
US-20040033700-A1 Electronic device manufacture SHIPLEY COMPANY, L.L.C. (US) 2004-02-19 US disclosed
EP-1369908-A2 Methods for depositing pinhole-defect free organic polysilica coatings Shipley Company LLC (US) 2003-12-10 EP disclosed