Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.57 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.57 |
| ▸ | HTR2A | P28223 | 2/20 | 0.47 |
| ▸ | DRD2 | P14416 | 1/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | SCN4A | P35499 | 7/20 | 0.44 |
| ▸ | SCN8A | Q9UQD0 | 5/20 | 0.44 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | SCN1A | P35498 | 2/20 | 0.44 |
| ▸ | SCN5A | Q14524 | 2/20 | 0.44 |
| ▸ | SCN9A | Q15858 | 2/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.44 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.44 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.44 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | KCNK3 | O14649 | 1/20 | 0.44 |
| ▸ | CACNA1F | O60840 | 1/20 | 0.44 |
| ▸ | KCNK2 | O95069 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Dimethylformamide SCHEMBL28355233 | 0.87 | ALDH1A1 (0.47) | ALDH1A1KDM4EHTR2ADRD2SMN1; SMN2 | |
| SCHEMBL20102193 | 0.86 | KDM4E (0.49) | ALDH1A1KDM4EHTR2ADRD2SMN1; SMN2 | |
| SCHEMBL19456538 | 0.84 | ALDH1A1 (0.57) | ALDH1A1KDM4EHTR2ADRD2SMN1; SMN2 | |
| SCHEMBL28042959 | 0.83 | ALDH1A1 (0.53) | ALDH1A1KDM4EHTR2ASMN1; SMN2SCN4A | |
| SCHEMBL13696459 | 0.81 | SCN8A (0.48) | ALDH1A1KDM4EHTR2ASMN1; SMN2SCN4A | |
| O-Xylene SCHEMBL9375721 | 0.81 | TSHR (0.50) | ALDH1A1KDM4ESMN1; SMN2LMNACYP1A2 | |
| SCHEMBL16016038 | 0.81 | TSHR (0.41) | ALDH1A1KDM4ESMN1; SMN2SCN4ASCN8A | |
| O-Xylene SCHEMBL5353236 | 0.81 | TSHR (0.50) | ALDH1A1KDM4ESMN1; SMN2LMNACYP1A2 | |
| SCHEMBL10348443 | 0.80 | MAPT (0.51) | ALDH1A1KDM4EHTR2ADRD2LMNA | |
| SCHEMBL10348383 | 0.80 | MAPT (0.51) | ALDH1A1KDM4EHTR2ADRD2LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105511228-B | Photoresist compositions and related methods of forming electronic devices | 罗门哈斯电子材料有限责任公司 | 2020-01-14 | — | — | CN | disclosed |
| US-9606434-B2 | Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method | ROHM AND HAAS ELECTRONIC MATERIALS, LLC (US) | 2017-03-28 | — | — | US | disclosed |
| US-9606434-B2 | Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method | ROHM AND HAAS ELECTRONIC MATERIALS, LLC (US) | 2017-03-28 | — | — | US | disclosed |
| US-9557642-B2 | Photoresist composition and associated method of forming an electronic device | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-01-31 | — | — | US | disclosed |
| US-9557642-B2 | Photoresist composition and associated method of forming an electronic device | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-01-31 | — | — | US | disclosed |
| US-9551930-B2 | Photoresist composition and associated method of forming an electronic device | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-01-24 | — | — | US | disclosed |
| US-9551930-B2 | Photoresist composition and associated method of forming an electronic device | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-01-24 | — | — | US | disclosed |
| US-9527936-B2 | Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-12-27 | — | — | US | disclosed |
| US-9527936-B2 | Polymer comprising repeat units with photoacid-generating functionality and base-solubility-enhancing functionality, and associated photoresist composition and electronic device forming method | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2016-12-27 | — | — | US | disclosed |
| US-9470976-B2 | — | — | 2016-10-18 | — | — | US | disclosed |
| CN-105511228-A | Photoresist composition and associated method of forming electronic device | ROHM & HAAS ELECT MAT | 2016-04-20 | — | — | CN | disclosed |
| CN-105511225-A | Photoresist composition and associated method of forming electronic device | ROHM & HAAS ELECT MAT | 2016-04-20 | — | — | CN | disclosed |
| US-20160103392-A1 | PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRONIC DEVICE | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2016-04-14 | — | — | US | disclosed |
| US-20160102158-A1 | POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONALITY AND BASE-SOLUBILITY-ENHANCING FUNCTIONALITY, AND ASSOCIATED PHOTORESIST COMPOSITION AND ELECTRONIC DEVICE FORMING METHOD | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2016-04-14 | — | — | US | disclosed |
| US-20160103391-A1 | PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRONIC DEVICE | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2016-04-14 | — | — | US | disclosed |
| US-20160103392-A1 | PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRONIC DEVICE | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2016-04-14 | — | — | US | disclosed |
| US-20160103391-A1 | PHOTORESIST COMPOSITION AND ASSOCIATED METHOD OF FORMING AN ELECTRONIC DEVICE | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2016-04-14 | — | — | US | disclosed |
| US-20160102157-A1 | POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONALITY AND BASE-SOLUBILITY-ENHANCING FUNCTIONALITY, AND ASSOCIATED PHOTORESIST COMPOSITION AND ELECTRONIC DEVICE FORMING METHOD | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2016-04-14 | — | — | US | disclosed |
| US-20160102158-A1 | POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONALITY AND BASE-SOLUBILITY-ENHANCING FUNCTIONALITY, AND ASSOCIATED PHOTORESIST COMPOSITION AND ELECTRONIC DEVICE FORMING METHOD | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2016-04-14 | — | — | US | disclosed |
| US-20160102157-A1 | POLYMER COMPRISING REPEAT UNITS WITH PHOTOACID-GENERATING FUNCTIONALITY AND BASE-SOLUBILITY-ENHANCING FUNCTIONALITY, AND ASSOCIATED PHOTORESIST COMPOSITION AND ELECTRONIC DEVICE FORMING METHOD | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2016-04-14 | — | — | US | disclosed |