SCHEMBL17708339

SCHEMBL17708339

CCC(C)(C)C(=O)OCC(N)=O

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 1/20 0.36
CYP4A11 Q02928 1/20 0.36
ALOX15 P16050 2/20 0.36
LMNA P02545 3/20 0.35
HSD17B10 Q99714 2/20 0.35
KDM4E B2RXH2 5/20 0.34
ALDH1A1 P00352 3/20 0.34
HTT P42858 2/20 0.34
HMGCR P04035 1/20 0.31
GAA P10253 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
GMNN O75496 1/20 0.31
USP2 O75604 1/20 0.31
TP53 P04637 1/20 0.31
CYP1A2 P05177 1/20 0.31
GLA P06280 1/20 0.31
POLB P06746 1/20 0.31
CYP3A4 P08684 1/20 0.31
CYP2C9 P11712 1/20 0.31
HPGD P15428 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13402881 0.82 PKM (0.39) ALDH1A1HTTCYP1A2BLMPKM
SCHEMBL800512 0.80 PAM (0.39) CYP4F2CYP4A11HMGCRL3MBTL1GLA
SCHEMBL16352658 0.80 CYP4F2 (0.37) CYP4F2CYP4A11LMNAHSD17B10KDM4E
SCHEMBL6205519 0.79 PRKCA (0.41) CYP4F2CYP4A11ALOX15LMNAHSD17B10
SCHEMBL19386946 0.79 CYP4F2 (0.34) CYP4F2CYP4A11ALOX15LMNAHSD17B10
SCHEMBL17589176 0.78 MAPK1 (0.42) CYP4F2CYP4A11KDM4EALDH1A1HTT
SCHEMBL17589170 0.78 TDP1 (0.38) CYP4F2CYP4A11ALDH1A1HMGCRTDP1
SCHEMBL26363345 0.78 CYP4F2 (0.37) CYP4F2CYP4A11ALOX15LMNAHSD17B10
SCHEMBL16376477 0.77 CYP4F2 (0.38) CYP4F2CYP4A11ALDH1A1HMGCR
SCHEMBL10033549 0.77 CYP4F2 (0.35) CYP4F2CYP4A11LMNAHSD17B10ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9639002-B2 Method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2017-05-02 US disclosed
US-20160116843-A1 METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2016-04-28 US disclosed