SCHEMBL17708341

SCHEMBL17708341

CCC(C)(C)C(=O)OC(C)(F)F

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
DGAT1 O75907 1/20 0.33
CYP4F2 P78329 1/20 0.31
CYP4A11 Q02928 1/20 0.31
RIPK1 Q13546 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10174307 0.86 CYP4F2 (0.31) CYP4F2CYP4A11RIPK1
SCHEMBL47394 0.85 DGAT1 (0.46) DGAT1CYP4F2CYP4A11RIPK1
SCHEMBL10103515 0.82
SCHEMBL12110026 0.82
SCHEMBL26009259 0.82
SCHEMBL13995695 0.82 RIPK1 (0.31) RIPK1
SCHEMBL10115635 0.82
SCHEMBL107795 0.82
SCHEMBL19844755 0.82
SCHEMBL10168020 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9639002-B2 Method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2017-05-02 US disclosed
US-20160116843-A1 METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2016-04-28 US disclosed