Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NAAA | Q02083 | 1/20 | 0.65 |
| ▸ | HTT | P42858 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.46 |
| ▸ | TSHR | P16473 | 2/20 | 0.46 |
| ▸ | RAD52 | P43351 | 1/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.41 |
| ▸ | THRB | P10828 | 1/20 | 0.41 |
| ▸ | FAAH | O00519 | 1/20 | 0.40 |
| ▸ | HTR2C | P28335 | 1/20 | 0.39 |
| ▸ | DGKA | P23743 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 2/20 | 0.38 |
| ▸ | CES2 | O00748 | 1/20 | 0.38 |
| ▸ | MGAM | O43451 | 1/20 | 0.37 |
| ▸ | SI | P14410 | 1/20 | 0.37 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.37 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28434878 | 0.98 | NAAA (0.69) | NAAAHTTALDH1A1TSHRRAD52 | |
| SCHEMBL445680 | 0.95 | NAAA (0.59) | NAAAHTTALDH1A1TSHRRAD52 | |
| SCHEMBL11409696 | 0.91 | NAAA (0.71) | NAAAHTTALDH1A1TSHRRAD52 | |
| SCHEMBL50185 | 0.88 | NAAA (0.81) | NAAAHTTALDH1A1TSHRRAD52 | |
| SCHEMBL29414407 | 0.86 | HTR2C (0.52) | NAAAALDH1A1TSHRRAD52NPSR1 | |
| SCHEMBL106760 | 0.86 | ALDH1A1 (0.62) | NAAAHTTALDH1A1TSHRTHRB | |
| SCHEMBL14472850 | 0.85 | NAAA (0.86) | NAAAHTTTSHRRAD52NPSR1 | |
| SCHEMBL3993048 | 0.85 | NAAA (0.86) | NAAAHTTTSHRRAD52NPSR1 | |
| SCHEMBL12956536 | 0.85 | NAAA (0.86) | NAAAHTTTSHRRAD52NPSR1 | |
| Ether SCHEMBL38599 | 0.85 | NAAA (0.84) | NAAAHTTALDH1A1TSHRRAD52 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10663863-B2 | Method of producing layer structure, and method of forming patterns | SAMSUNG SDI CO., LTD. (KR) | 2020-05-26 | — | — | US | claimed |
| US-10312074-B2 | Method of producing layer structure, layer structure, and method of forming patterns | SAMSUNG SDI CO., LTD. (KR) | 2019-06-04 | — | — | US | claimed |
| US-20170115572-A1 | METHOD OF PRODUCING LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2017-04-27 | — | — | US | claimed |
| US-20160126088-A1 | METHOD OF PRODUCING LAYER STRUCTURE, LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS | SAMSUNG SDI CO., LTD. (KR) | 2016-05-05 | — | — | US | claimed |
| WO-2025071108-A1 | RESIN COMPOSITION FOR ANTI-REFLECTIVE FILM, ANTI-REFLECTIVE FILM, AND SOLID-STATE IMAGING DEVICE | 동우 화인켐 주식회사 | 2025-04-03 | — | — | WO | disclosed |
| CN-108241258-B | Resin composition for liquid crystal display device, film for liquid crystal display device, and copolymer | 住友化学株式会社 | 2022-10-18 | — | — | CN | disclosed |
| CN-107272342-B | Negative photosensitive resin composition | 东友精细化工有限公司 | 2021-03-05 | — | — | CN | disclosed |
| CN-105938298-B | Negative photosensitive resin composition, photocured pattern formed by using same and image display device | 东友精细化工有限公司 | 2020-12-29 | — | — | CN | disclosed |
| CN-107434941-B | Resin composition and cured film | 住友化学株式会社 | 2020-10-30 | — | — | CN | disclosed |
| CN-107949876-B | Window substrate, method of manufacturing the same, and image display device having the same | 东友精细化工有限公司 | 2020-07-31 | — | — | CN | disclosed |
| US-10663863-B2 | Method of producing layer structure, and method of forming patterns | SAMSUNG SDI CO., LTD. (KR) | 2020-05-26 | — | — | US | disclosed |
| CN-105785720-B | Photosensitive resin composition, photocured pattern formed therefrom, and image display device having the same | 东友精细化工有限公司 | 2020-02-07 | — | — | CN | disclosed |
| CN-105431752-A | Retardation film and image display device having same | DONGWOO FINE CHEM CO LTD | 2016-03-23 | — | — | CN | disclosed |
| CN-105408780-A | Phase difference film and image display device provided with same | DONGWOO FINE CHEM CO LTD | 2016-03-16 | — | — | CN | disclosed |
| CN-105319837-A | Method of preparing photoresist pattern | DONGWOO FINE CHEM CO LTD | 2016-02-10 | — | — | CN | disclosed |
| CN-105319850-A | Photonasty resin composition | DONGWOO FINE CHEM CO LTD | 2016-02-10 | — | — | CN | disclosed |
| CN-105093846-A | Method for forming photocuring pattern | DONGWOO FINE CHEM CO LTD | 2015-11-25 | — | — | CN | disclosed |
| CN-104977808-A | Black photosensitive resin composite and black matrix made from the black photosensitive resin composite | DONGWOO FINE CHEM CO LTD | 2015-10-14 | — | — | CN | disclosed |
| CN-104950578-A | Colored photosensitive resin composition and color filter manufactured by the same | DONGWOO FINE CHEM CO LTD | 2015-09-30 | — | — | CN | disclosed |
| CN-101738863-B | Photosensitive resin composition and display | SUMITOMO CHEMICAL CO | 2015-01-07 | — | — | CN | disclosed |