SCHEMBL106760

SCHEMBL106760

CCOCCOC(=O)CC

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.62
TSHR P16473 1/20 0.62
THRB P10828 1/20 0.54
NAAA Q02083 1/20 0.52
DGKA P23743 1/20 0.41
GAA P10253 2/20 0.40
MGAM O43451 1/20 0.40
SI P14410 1/20 0.40
MGAM2 Q2M2H8 1/20 0.40
SOAT1 P35610 1/20 0.40
HSD17B10 Q99714 2/20 0.40
HTT P42858 1/20 0.38
THRA P10827 1/20 0.38
CYP1A2 P05177 1/20 0.38
HPGD P15428 1/20 0.38
CYP2C19 P33261 1/20 0.38
BLM P54132 1/20 0.38
WRN Q14191 1/20 0.38
HIF1A Q16665 1/20 0.38
TRPA1 O75762 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5411907 0.98 ALDH1A1 (0.60) ALDH1A1TSHRTHRBNAAADGKA
SCHEMBL181390 0.98 ALDH1A1 (0.60) ALDH1A1TSHRTHRBNAAADGKA
SCHEMBL5386328 0.91 TSHR (0.54) ALDH1A1TSHRTHRBNAAADGKA
SCHEMBL3114270 0.90 NAAA (0.56) ALDH1A1TSHRTHRBNAAADGKA
SCHEMBL12673159 0.90 NAAA (0.56) ALDH1A1TSHRTHRBNAAADGKA
SCHEMBL347888 0.90 NAAA (0.56) ALDH1A1TSHRTHRBNAAADGKA
SCHEMBL181724 0.90 NAAA (0.56) ALDH1A1TSHRTHRBNAAADGKA
SCHEMBL50301 0.87 NAAA (0.64) ALDH1A1TSHRNAAADGKAGAA
SCHEMBL17710652 0.86 NAAA (0.65) ALDH1A1TSHRTHRBNAAADGKA
SCHEMBL445680 0.86 NAAA (0.59) ALDH1A1TSHRTHRBNAAADGKA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3264 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250377591-A1 PHOTORESIST COMPOSITION AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE SAMSUNG ELECTRONICS CO LTD (KR) 2025-12-11 US claimed
US-12216403-B2 Positive photosensitive resin composition and display device using the same DONJIN SEMICHEM CO., LTD. (KR) 2025-02-04 US claimed
US-20240118616-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND DISPLAY DEVICE USING THE SAME DONGJIN SEMICHEM CO., LTD. (KR) 2024-04-11 US claimed
CN-116487723-A Production process of explosion-proof piece of lithium battery cover plate 上海富锲智能科技有限公司 2023-07-25 CN claimed
CN-114409342-B Preparation method of ceramic tile glue 清远楼邦建材科技有限公司 2022-09-16 CN claimed
CN-114556216-A Positive photosensitive resin composition and display element using the same 株式会社东进世美肯 2022-05-27 CN claimed
CN-114409342-A Preparation method of ceramic tile glue 清远楼邦建材科技有限公司 2022-04-29 CN claimed
US-20210333709-A1 ORGANIC-INORGANIC HYBRID PHOTORESIST PROCESSING LIQUID COMPOSITION YOUNG CHANG CHEMICAL CO., LTD (KR) 2021-10-28 US claimed
EP-3835870-A1 ORGANIC-INORGANIC HYBRID PHOTORESIST PROCESSING LIQUID COMPOSITION Young Chang Chemical Co., Ltd. (KR) 2021-06-16 EP claimed
CN-108192488-B Solvent-based bi-component high-smoothness varnish composition, preparation method and application 广州立邦涂料有限公司 2021-03-02 CN claimed
EP-0763065-A1 USE OF GLYCOL ETHER COMPOUNDS FOR THE PRODUCTION OF POLYOLEFIN CATALYSTS AND SUPPORTS W.R. Grace & Co.-Conn. (US) 1997-03-19 EP claimed
US-5599762-A MIXING WATER-CONTAINING OXIDE HYDROGEL WITH LIQUID GLYCOL ETHER ESTER, REMOVING WATER BY AZEOTROPIC DISTILLATION TO FORM XEROGEL, REMOVING LIQUID W. R. GRACE & CO.-CONN. (US) 1997-02-04 US claimed
CN-1137346-A Synergistic weedicide composite SICHUAN PROV NATURAL RESOURCES (CN) 1996-12-11 CN claimed
US-5576262-A CHROMIUM OXIDE GELS AND AZEOTROPIC DISTILLATION OF MIXTURES WITH SOLVENTS W. R. GRACE & CO.-CONN. (US) 1996-11-19 US claimed
WO-1995033777-A1 USE OF GLYCOL ETHER COMPOUNDS FOR THE PRODUCTION OF POLYOLEFIN CATALYSTS AND SUPPORTS W.R. GRACE & CO.-CONN. (US) 1995-12-14 WO claimed
EP-0568476-B1 Silicon-containing positive resist and method of using the same in thin film packaging technology IBM (US) 1995-10-11 EP claimed
US-5422223-A Polysilsesquioxanes having diazonaphthoquinone sulfonyloxy group modifiers; barrier films for lithographic process INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1995-06-06 US claimed
EP-0568476-A2 Silicon-containing positive resist and method of using the same in thin film packaging technology International Business Machines Corporation (US) 1993-11-03 EP claimed
CN-1064274-A The pyridinesulfonamide compound or its salt, their preparation method and the weedicide that contains above-claimed cpd that replace ISHIHARA SANGYO KAISHA (JP) 1992-09-09 CN claimed
US-4322550-A HIGH-SPEED SOLVENT EXTRACTION FROM AN AQUEOUS SOLUTION PHILLIPS PETROLEUM COMPANY (US) 1982-03-30 US claimed