SCHEMBL445680

SCHEMBL445680

CCOCCCOC(=O)CC

nearest known ligand 0.59

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.59
ALDH1A1 P00352 3/20 0.46
TSHR P16473 2/20 0.46
HTT P42858 1/20 0.43
THRB P10828 1/20 0.41
DGKA P23743 1/20 0.39
GAA P10253 2/20 0.38
RAD52 P43351 1/20 0.37
NPSR1 Q6W5P4 1/20 0.37
MGAM O43451 1/20 0.37
SI P14410 1/20 0.37
MGAM2 Q2M2H8 1/20 0.37
SOAT1 P35610 1/20 0.37
FAAH O00519 1/20 0.36
DNM1 Q05193 1/20 0.36
POLB P06746 1/20 0.36
ATM Q13315 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17710652 0.95 NAAA (0.65) NAAAALDH1A1TSHRHTTTHRB
SCHEMBL28434878 0.93 NAAA (0.69) NAAAALDH1A1TSHRHTTTHRB
SCHEMBL2600809 0.88 NAAA (0.73) NAAAALDH1A1TSHRHTTDGKA
SCHEMBL11409696 0.86 NAAA (0.71) NAAAALDH1A1TSHRHTTTHRB
SCHEMBL106760 0.86 ALDH1A1 (0.62) NAAAALDH1A1TSHRHTTTHRB
SCHEMBL448126 0.84 NAAA (0.69) NAAAALDH1A1TSHRHTTDGKA
SCHEMBL448036 0.84 NAAA (0.63) NAAAALDH1A1TSHRHTTDGKA
SCHEMBL5411907 0.84 ALDH1A1 (0.60) NAAAALDH1A1TSHRHTTTHRB
SCHEMBL181390 0.84 ALDH1A1 (0.60) NAAAALDH1A1TSHRHTTTHRB
SCHEMBL50185 0.83 NAAA (0.81) NAAAALDH1A1TSHRHTTDGKA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10663863-B2 Method of producing layer structure, and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2020-05-26 US claimed
US-10312074-B2 Method of producing layer structure, layer structure, and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2019-06-04 US claimed
US-20170115572-A1 METHOD OF PRODUCING LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2017-04-27 US claimed
US-20160126088-A1 METHOD OF PRODUCING LAYER STRUCTURE, LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2016-05-05 US claimed
EP-2652832-A1 BATTERY ELECTROLYTE SOLUTION CONTAINING CERTAIN ESTER-BASED SOLVENTS, AND BATTERIES CONTAINING SUCH AN ELECTROLYTE SOLUTION Dow Global Technologies LLC (US) 2013-10-23 EP claimed
WO-2012082760-A1 BATTERY ELECTROLYTE SOLUTION CONTAINING CERTAIN ESTER-BASED SOLVENTS, AND BATTERIES CONTAINING SUCH AN ELECTROLYTE SOLUTION DOW GLOBAL TECHNOLOGIES LLC (US) 2012-06-21 WO claimed
WO-2024158178-A1 THERMOSETTING RESIN COMPOSITION, CURED FILM, AND SOLID-STATE IMAGING DEVICE 동우 화인켐 주식회사 2024-08-02 WO disclosed
WO-2024147537-A1 RESIN COMPOSITION FOR ANTI-REFLECTION FILM, ANTI-REFLECTION FILM, AND SOLID-STATE IMAGING DEVICE 동우 화인켐 주식회사 2024-07-11 WO disclosed
CN-111258190-A Method for manufacturing semiconductor device 台湾积体电路制造股份有限公司 2020-06-09 CN disclosed
US-10663863-B2 Method of producing layer structure, and method of forming patterns SAMSUNG SDI CO., LTD. (KR) 2020-05-26 US disclosed
CN-111123643-A Protective composition and method for forming photoresist pattern 台湾积体电路制造股份有限公司 2020-05-08 CN disclosed
US-10391750-B2 Cover window plate and image display device including the same DONGWOO FINE-CHEM CO., LTD. (KR) 2019-08-27 US disclosed
CN-105575775-B Layer structure and the method and semiconductor device for manufacturing its method, forming pattern 三星SDI株式会社 2019-08-13 CN disclosed
US-20160126088-A1 METHOD OF PRODUCING LAYER STRUCTURE, LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS SAMSUNG SDI CO., LTD. (KR) 2016-05-05 US disclosed
EP-2652832-A1 BATTERY ELECTROLYTE SOLUTION CONTAINING CERTAIN ESTER-BASED SOLVENTS, AND BATTERIES CONTAINING SUCH AN ELECTROLYTE SOLUTION Dow Global Technologies LLC (US) 2013-10-23 EP disclosed
US-20120270142-A1 PHOTOSENSITIVE COMPOSITION AND METHOD OF MANUFACTURING A SUBSTRATE FOR A DISPLAY DEVICE USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-10-25 US disclosed
WO-2012082760-A1 BATTERY ELECTROLYTE SOLUTION CONTAINING CERTAIN ESTER-BASED SOLVENTS, AND BATTERIES CONTAINING SUCH AN ELECTROLYTE SOLUTION DOW GLOBAL TECHNOLOGIES LLC (US) 2012-06-21 WO disclosed
US-20120064455-A1 PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME SAMSUNG TECHWIN CO., LTD. (KR) 2012-03-15 US disclosed
US-20090087662-A1 HOLLOW PARTICLES, METHOD FOR PRODUCING SAME, AND THERMAL TRANSFER IMAGE-RECEIVING SHEET FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-20060177767-A1 Photosensitive resin composition, thin film panel including a layer made from photosensitive resin composition, and method for manufacturing thin film panel SAMSUNG ELECTRONICS CO., LTD. 2006-08-10 US disclosed