Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C19 | P33261 | 1/20 | 0.49 |
| ▸ | NAAA | Q02083 | 2/20 | 0.47 |
| ▸ | HTT | P42858 | 2/20 | 0.46 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.44 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.43 |
| ▸ | CA1 | P00915 | 2/20 | 0.38 |
| ▸ | CA2 | P00918 | 2/20 | 0.38 |
| ▸ | STS | P08842 | 4/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.37 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
| ▸ | CA12 | O43570 | 1/20 | 0.36 |
| ▸ | CA9 | Q16790 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.35 |
| ▸ | HPGD | P15428 | 2/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | MIF | P14174 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18775934 | 1.00 | CYP2C19 (0.49) | CYP2C19NAAAHTTCYP19A1EPHX1 | |
| SCHEMBL18776038 | 1.00 | CYP2C19 (0.49) | CYP2C19NAAAHTTCYP19A1EPHX1 | |
| SCHEMBL18775961 | 1.00 | CYP2C19 (0.49) | CYP2C19NAAAHTTCYP19A1EPHX1 | |
| SCHEMBL18775927 | 1.00 | CYP2C19 (0.49) | CYP2C19NAAAHTTCYP19A1EPHX1 | |
| SCHEMBL15219799 | 0.98 | NAAA (0.46) | CYP2C19NAAAHTTCYP19A1EPHX1 | |
| SCHEMBL18775900 | 0.94 | NAAA (0.42) | CYP2C19NAAAHTTCYP19A1EPHX1 | |
| SCHEMBL18775928 | 0.88 | CYP2C19 (0.42) | CYP2C19NAAAHTTCYP19A1EPHX1 | |
| SCHEMBL23143133 | 0.85 | CYP2C19 (0.44) | CYP2C19NAAAHTTCYP19A1EPHX1 | |
| SCHEMBL15800922 | 0.81 | CYP2C19 (0.46) | CYP2C19NAAAHTTCYP19A1EPHX1 | |
| SCHEMBL23140775 | 0.81 | NAAA (0.53) | CYP2C19NAAAHTTCYP19A1EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230140810-A1 | MATERIAL FOR FORMING ADHESIVE FILM, PATTERNING PROCESS, AND METHOD FOR FORMING ADHESIVE FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-04 | — | — | US | disclosed |
| US-20230140810-A1 | MATERIAL FOR FORMING ADHESIVE FILM, PATTERNING PROCESS, AND METHOD FOR FORMING ADHESIVE FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-04 | — | — | US | disclosed |
| US-20230059089-A1 | MATERIAL FOR FORMING ADHESIVE FILM, METHOD FOR FORMING ADHESIVE FILM USING THE SAME, AND PATTERNING PROCESS USING MATERIAL FOR FORMING ADHESIVE FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-02-23 | — | — | US | disclosed |
| EP-4116770-A1 | MATERIAL FOR FORMING ADHESIVE FILM, METHOD FOR FORMING ADHESIVE FILM USING THE SAME, AND PATTERNING PROCESS USING MATERIAL FOR FORMING ADHESIVE FILM | Shin-Etsu Chemical Co., Ltd. (JP) | 2023-01-11 | — | — | EP | disclosed |
| US-11366386-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-06-21 | — | — | US | disclosed |
| US-11231649-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-01-25 | — | — | US | disclosed |
| US-20210088905-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2021-03-25 | — | — | US | disclosed |
| US-10844257-B2 | Adhesive composition, bio-electrode, and method for manufacturing a bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-11-24 | — | — | US | disclosed |
| US-10808148-B2 | Adhesive composition, bio-electrode, method for manufacturing a bio-electrode, and salt | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-10-20 | — | — | US | disclosed |
| US-20190354016-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-11-21 | — | — | US | disclosed |
| US-20190354017-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-11-21 | — | — | US | disclosed |
| US-20190258160-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-08-22 | — | — | US | disclosed |
| US-20180086948-A1 | ADHESIVE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING A BIO-ELECTRODE, AND SALT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-29 | — | — | US | disclosed |
| US-20180086948-A1 | ADHESIVE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING A BIO-ELECTRODE, AND SALT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-29 | — | — | US | disclosed |
| US-20180072930-A1 | ADHESIVE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING A BIO-ELECTRODE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-15 | — | — | US | disclosed |
| US-20180072930-A1 | ADHESIVE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING A BIO-ELECTRODE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-03-15 | — | — | US | disclosed |
| US-20170115566-A1 | RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-27 | — | — | US | disclosed |
| US-20170115566-A1 | RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-27 | — | — | US | disclosed |
| US-9436093-B2 | Pattern forming process and shrink agent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-09-06 | — | — | US | disclosed |
| US-20160124312-A1 | PATTERN FORMING PROCESS AND SHRINK AGENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-05-05 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170115566-A1 | RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM, CESIUM AND CERIUM SALTS | CASR, LIFR, LBR | CYP2C19 4640/4885NAAA 1230/4885HTT 3879/4885 |
| US-10808148-B2 | Adhesive composition, bio-electrode, method for manufacturing a bio-electrode, and salt | SLC9A1, FN1, EPCAM | CYP2C19 3037/4885NAAA 342/4885HTT 3526/4885 |
| US-11366386-B2 | Patterning process | FEM1B, EGLN1, TET1 | CYP2C19 2093/4885NAAA 1485/4885HTT 1626/4885 |
| US-20180086948-A1 | ADHESIVE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING A BIO-ELECTRODE, AND SALT | SLC9A1, FN1, EPCAM | CYP2C19 3102/4885NAAA 353/4885HTT 3546/4885 |
| US-20190354017-A1 | PATTERNING PROCESS | FEM1B, EGLN1, TET1 | CYP2C19 2093/4885NAAA 1485/4885HTT 1626/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.