Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC2A1 | P11166 | 1/20 | 0.48 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | PLA2G4B | P0C869 | 3/20 | 0.43 |
| ▸ | RARB | P10826 | 4/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | THRA | P10827 | 1/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | PPARG | P37231 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17127019 | 0.89 | LMNA (0.41) | SLC2A1PLA2G4BTHRAALDH1A1HPGD | |
| SCHEMBL15935680 | 0.88 | SMN1; SMN2 (0.46) | SLC2A1MEN1ALDH1A1HPGDKMT2A | |
| SCHEMBL15935664 | 0.85 | HTT (0.41) | SLC2A1RARBGAAMEN1ALDH1A1 | |
| SCHEMBL17126976 | 0.84 | PPARA (0.40) | ALDH1A1HPGDSMN1; SMN2PPARG | |
| SCHEMBL17126977 | 0.83 | PARP10 (0.44) | SLC2A1TP53TSHRL3MBTL1ALDH1A1 | |
| SCHEMBL17127025 | 0.82 | PARP10 (0.43) | SLC2A1TP53TSHRPLA2G4BL3MBTL1 | |
| SCHEMBL17127023 | 0.80 | KDM4E (0.37) | TP53L3MBTL1MEN1ALDH1A1KMT2A | |
| SCHEMBL17126856 | 0.80 | SMN1; SMN2 (0.33) | SLC2A1L3MBTL1MEN1KMT2ASMN1; SMN2 | |
| SCHEMBL17127022 | 0.80 | PTGS2 (0.38) | L3MBTL1MEN1ALDH1A1KMT2ASMN1; SMN2 | |
| SCHEMBL17126862 | 0.80 | AKR1C3 (0.39) | SLC2A1ALDH1A1HPGDSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160147157-A1 | PATTERN FORMATION METHOD, PATTERN, AND ETCHING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE USING SAME | FUJIFILM CORPORATION (JP) | 2016-05-26 | — | — | US | disclosed |