⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL724457 | 0.67 | — | — | |
| SCHEMBL495810 | 0.67 | — | — | |
| SCHEMBL10944574 | 0.64 | — | — | |
| SCHEMBL9463582 | 0.64 | — | — | |
| SCHEMBL1585526 | 0.64 | — | — | |
| SCHEMBL1103757 | 0.58 | — | — | |
| Trimethylammonium SCHEMBL27481582 | 0.58 | — | — | |
| SCHEMBL1013364 | 0.55 | — | — | |
| SCHEMBL49474 | 0.55 | — | — | |
| Trimethylammonium SCHEMBL28164962 | 0.55 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4747425-A1 | INHERENT AREA SELECTIVE DEPOSITION OF SILICON-CONTAINING DIELECTRIC ON PATTERNED SUBSTRATE | GELEST, INC. (US) | 2026-05-27 | — | — | EP | claimed |
| CN-122071548-A | Impact-resistant polypropylene and preparation method thereof | 中国石油化工股份有限公司 | 2026-05-22 | — | — | CN | claimed |
| US-20250320604-A1 | LOW TEMPERATURE PLASMA DEPOSITION OF SILICON-CONTAINING FILMS USING HYDROGEN PEROXIDE | GELEST INC (US) | 2025-10-16 | — | — | US | claimed |
| US-20250305131-A1 | LOW TEMPERATURE THERMAL DEPOSITION OF SILICON-CONTAINING FILMS USING LOW WATER CONTENT HYDROGEN PEROXIDE | GELEST, INC. | 2025-10-02 | — | — | US | claimed |
| US-20250112041-A1 | INHERENT AREA SELECTIVE DEPOSITION OF SILICON-CONTAINING DIELECTRIC ON PATTERNED SUBSTRATE | GELEST, INC. | 2025-04-03 | — | — | US | claimed |
| WO-2025019704-A1 | INHERENT AREA SELECTIVE DEPOSITION OF SILICON-CONTAINING DIELECTRIC ON PATTERNED SUBSTRATE | GELEST, INC. (US) | 2025-01-23 | — | — | WO | claimed |
| CN-107299307-B | Polishing liquid composition | 奎克化学（中国）有限公司 | 2020-08-28 | — | — | CN | claimed |
| EP-4747425-A1 | INHERENT AREA SELECTIVE DEPOSITION OF SILICON-CONTAINING DIELECTRIC ON PATTERNED SUBSTRATE | GELEST, INC. (US) | 2026-05-27 | — | — | EP | disclosed |
| CN-122071548-A | Impact-resistant polypropylene and preparation method thereof | 中国石油化工股份有限公司 | 2026-05-22 | — | — | CN | disclosed |
| US-20250320604-A1 | LOW TEMPERATURE PLASMA DEPOSITION OF SILICON-CONTAINING FILMS USING HYDROGEN PEROXIDE | GELEST INC (US) | 2025-10-16 | — | — | US | disclosed |
| US-20250305131-A1 | LOW TEMPERATURE THERMAL DEPOSITION OF SILICON-CONTAINING FILMS USING LOW WATER CONTENT HYDROGEN PEROXIDE | GELEST, INC. | 2025-10-02 | — | — | US | disclosed |
| US-20250250667-A1 | PROCESSING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, PROCESSING APPARATUS, AND RECORDING MEDIUM | Kokusai Electric Corporation (JP) | 2025-08-07 | — | — | US | disclosed |
| US-20250232975-A1 | METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM | Kokusai Electric Corporation (JP) | 2025-07-17 | — | — | US | disclosed |
| US-20230386947-A1 | SEMICONDUCTOR DEVICE AND METHOD | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2023-11-30 | — | — | US | disclosed |
| US-20210249318-A1 | Semiconductor Device and Method | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2021-08-12 | — | — | US | disclosed |
| US-10991636-B2 | Semiconductor device and method | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2021-04-27 | — | — | US | disclosed |
| CN-107299307-B | Polishing liquid composition | 奎克化学（中国）有限公司 | 2020-08-28 | — | — | CN | disclosed |
| US-20190348337-A1 | Semiconductor Device and Method | TAIWAN SEMICONDUCTOR MFG CO LTD (TW) | 2019-11-14 | — | — | US | disclosed |
| US-9388132-B2 | Isobaric tandem mass tags for quantitative proteomics and peptidomics | WISCONSIN ALUMNI RESEARCH FOUNDATION (US) | 2016-07-12 | — | — | US | disclosed |
| EP-3029175-A1 | Process for the production of porous thin films | BASF SE (DE) | 2016-06-08 | — | — | EP | disclosed |