SCHEMBL17825875

SCHEMBL17825875

C=CC(=O)OCCNC(=O)Oc1ccc2ccccc2c1-c1c(OC(=O)NCCOC(=O)C=C)ccc2ccccc12

nearest known ligand 0.61

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
NCEH1 Q6PIU2 6/20 0.47
THRB P10828 1/20 0.43
ALDH1A1 P00352 2/20 0.39
KDM4E B2RXH2 1/20 0.39
HPGD P15428 1/20 0.39
CES2 O00748 1/20 0.38
PGR P06401 1/20 0.37
GAA P10253 1/20 0.37
PTGS1 P23219 1/20 0.37
MAPK1 P28482 1/20 0.37
HSD17B10 Q99714 1/20 0.37
MAPT P10636 2/20 0.36
FAAH O00519 1/20 0.35
DRD2 P14416 1/20 0.35
CNR1 P21554 1/20 0.35
DRD3 P35462 1/20 0.35
NPC1 O15118 1/20 0.35
RAB9A P51151 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20484007 0.96 NCEH1 (0.44) NCEH1THRBALDH1A1KDM4EHPGD
SCHEMBL29549028 0.93 NCEH1 (0.60) NCEH1THRBHPGDGAAFAAH
SCHEMBL19712926 0.93 NCEH1 (0.60) NCEH1THRBHPGDGAAFAAH
SCHEMBL29549156 0.92 NCEH1 (0.43) NCEH1THRBALDH1A1KDM4EHPGD
SCHEMBL19712930 0.92 NCEH1 (0.43) NCEH1THRBALDH1A1KDM4EHPGD
SCHEMBL29549149 0.92 ALDH1A1 (0.45) NCEH1ALDH1A1KDM4EHPGDMAPT
SCHEMBL19712902 0.92 ALDH1A1 (0.45) NCEH1ALDH1A1KDM4EHPGDMAPT
SCHEMBL19712903 0.91 NCEH1 (0.55) NCEH1THRB
SCHEMBL29549014 0.91 NCEH1 (0.41) NCEH1THRBALDH1A1KDM4EHPGD
SCHEMBL29549016 0.91 NCEH1 (0.55) NCEH1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11267943-B2 Film structure containing a photopolymer layer for holographic exposure and a coating layer of high resistance COVESTRO DEUTSCHLAND AG (DE) 2022-03-08 US disclosed
US-20210292505-A1 FILM STRUCTURE CONTAINING A PHOTOPOLYMER LAYER FOR HOLOGRAPHIC EXPOSURE AND A COATING LAYER OF HIGH RESISTANCE COVESTRO DEUTSCHLAND AG (DE) 2021-09-23 US disclosed
US-20200166888-A1 HOLOGRAPHIC MEDIUM CONTAINING A PHOTOPOLYMER LAYER FOR HOLOGRAPHIC EXPOSURE AND A HIGHLY RESISTANT COATING LAYER COVESTRO DEUTSCHLAND AG (DE) 2020-05-28 US disclosed
US-10241402-B2 Naphthyl acrylates as writing monomers for photopolymers COVESTRO DEUTSCHLAND AG (DE) 2019-03-26 US disclosed
US-20170363957-A1 NAPHTHYL ACRYLATES AS WRITING MONOMERS FOR PHOTOPOLYMERS COVESTRO DEUTSCHLAND AG (DE) 2017-12-21 US disclosed
EP-3230261-A1 NAPHTHYL ACRYLATES AS WRITING MONOMERS FOR PHOTOPOLYMERS Covestro Deutschland AG (DE) 2017-10-18 EP disclosed
WO-2016091965-A1 NAPHTHYL ACRYLATES AS WRITING MONOMERS FOR PHOTOPOLYMERS COVESTRO DEUTSCHLAND AG (DE) 2016-06-16 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170363957-A1 NAPHTHYL ACRYLATES AS WRITING MONOMERS FOR PHOTOPOLYMERS NEFM, ACR, DIAPH1 NCEH1 4259/4885THRB 4885/4885ALDH1A1 1558/4885
US-10241402-B2 Naphthyl acrylates as writing monomers for photopolymers NEFM, ACR, DIAPH1 NCEH1 4259/4885THRB 4885/4885ALDH1A1 1558/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.