Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.40 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.36 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.36 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 2/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | FKBP1A | P62942 | 2/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.31 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.31 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.31 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17830208 | 0.92 | ALDH1A1 (0.40) | ALDH1A1ADRB2ADRB1ADRB3MEN1 | |
| SCHEMBL17830193 | 0.88 | ALDH1A1 (0.37) | ALDH1A1ADRB2ADRB1ADRB3MEN1 | |
| SCHEMBL17832160 | 0.87 | ALDH1A1 (0.36) | ALDH1A1ADRB2ADRB1ADRB3MEN1 | |
| SCHEMBL17832174 | 0.81 | ALDH1A1 (0.39) | ALDH1A1ADRB2ADRB1ADRB3MEN1 | |
| SCHEMBL17832154 | 0.80 | ALDH1A1 (0.40) | ALDH1A1ADRB2ADRB1ADRB3MEN1 | |
| SCHEMBL17830189 | 0.79 | ALDH1A1 (0.39) | ALDH1A1ADRB2ADRB1ADRB3MEN1 | |
| SCHEMBL17830205 | 0.78 | PRKCA (0.33) | POLB | |
| SCHEMBL17830211 | 0.78 | ALDH1A1 (0.32) | ALDH1A1TSHR | |
| SCHEMBL17830215 | 0.76 | NAAA (0.33) | — | |
| SCHEMBL2625631 | 0.75 | ALDH1A1 (0.41) | ALDH1A1ADRB2ADRB1ADRB3MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9740102-B2 | Photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-22 | — | — | US | disclosed |
| US-20160170300-A1 | PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-06-16 | — | — | US | disclosed |