SCHEMBL17832154

SCHEMBL17832154

CCC(C)(COC(=O)C1CCCCC1)C(=O)OC(C(F)(F)F)C(F)(F)F

nearest known ligand 0.40

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.40
ADRB2 P07550 1/20 0.39
ADRB1 P08588 1/20 0.39
ADRB3 P13945 1/20 0.39
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
CTSK P43235 1/20 0.32
HTT P42858 1/20 0.32
HSD17B10 Q99714 1/20 0.31
FKBP1A P62942 2/20 0.31
TSHR P16473 2/20 0.31
MDM2 Q00987 1/20 0.31
MAPT P10636 1/20 0.31
TDP1 Q9NUW8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17830189 0.89 ALDH1A1 (0.39) ALDH1A1ADRB2ADRB1ADRB3MEN1
SCHEMBL19261580 0.85 ALDH1A1 (0.39) ALDH1A1ADRB2ADRB1ADRB3MEN1
SCHEMBL17830208 0.80 ALDH1A1 (0.40) ALDH1A1ADRB2ADRB1ADRB3MEN1
SCHEMBL17830202 0.80 ALDH1A1 (0.40) ALDH1A1ADRB2ADRB1ADRB3MEN1
SCHEMBL17832174 0.79 ALDH1A1 (0.39) ALDH1A1ADRB2ADRB1ADRB3MEN1
SCHEMBL17832149 0.78 ALDH1A1 (0.32) ALDH1A1HSD17B10TSHRTDP1
SCHEMBL17832152 0.78 PRKCA (0.40)
SCHEMBL17832151 0.76
SCHEMBL17832155 0.76 ALDH1A1 (0.32) ALDH1A1HTTMAPT
SCHEMBL17830193 0.76 ALDH1A1 (0.37) ALDH1A1ADRB2ADRB1ADRB3MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9740102-B2 Photoresist composition and method for producing photoresist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-22 US disclosed
US-20160170300-A1 PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-06-16 US disclosed