SCHEMBL17545733

SCHEMBL17545733

CC(C)C(=O)OCC(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
HTT P42858 1/20 0.39
ALDH1A1 P00352 1/20 0.35
POLB P06746 1/20 0.35
MAPT P10636 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16525497 0.94 HTT (0.38) HTTALDH1A1POLBMAPT
SCHEMBL16525491 0.92 HTT (0.36) HTTALDH1A1POLBMAPT
SCHEMBL16547502 0.87 FGFR1 (0.32) HTT
SCHEMBL805300 0.87 HTT (0.41) HTTALDH1A1POLBMAPT
SCHEMBL13790831 0.86 HTT (0.35) HTTALDH1A1POLBMAPT
SCHEMBL17150858 0.86 FGFR1 (0.32)
SCHEMBL16547522 0.84 POLB (0.30) POLB
SCHEMBL26731795 0.84 HTT (0.36) HTT
SCHEMBL17832175 0.84 ALDH1A1 (0.31) ALDH1A1POLBMAPT
SCHEMBL16547526 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10465033-B2 One step synthesis of ultrahigh molecular weight block copolymers CLEMSON UNIVERSITY RESEARCH FOUNDATION (US) 2019-11-05 US disclosed
US-20180127533-A1 One Step Synthesis of Ultrahigh Molecular Weight Block Copolymers CLEMSON UNIVERSITY RESEARCH FOUNDATION 2018-05-10 US disclosed
US-20180006324-A1 ELECTROLYTE, BATTERY, BATTERY PACK, ELECTRONIC APPARATUS, ELECTRIC VEHICLE, POWER STORAGE APPARATUS, AND POWER SYSTEM TOHOKU MURATA MANUFACTURING CO., LTD. (JP) 2018-01-04 US disclosed
US-9760005-B2 Salt, acid generator, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-09-12 US disclosed
US-9644056-B2 Compound, resin and photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-05-09 US disclosed
US-20160237190-A1 COMPOUND, RESIN AND PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-08-18 US disclosed
US-20160062233-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-03-03 US disclosed
US-20160052877-A1 SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-02-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160062233-A1 SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN XDH, HAX1, MLX HTT 2843/4885ALDH1A1 2530/4885POLB 1000/4885
US-20160237190-A1 COMPOUND, RESIN AND PHOTORESIST COMPOSITION HAX1, F11, RXRA HTT 2276/4885ALDH1A1 3120/4885POLB 2949/4885
US-20160052877-A1 SALT, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN RER1, AFF1, FRG1 HTT 1209/4885ALDH1A1 2206/4885POLB 3385/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.