SCHEMBL17870557

SCHEMBL17870557

O=C(OCCC(O)(C(F)(F)F)C(F)(F)F)c1cc(C(=O)OCCC(O)(C(F)(F)F)C(F)(F)F)cc(S(=O)(=O)O)c1

nearest known ligand 0.41

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
LCK P06239 1/20 0.41
FYN P06241 1/20 0.41
SERPINE1 P05121 3/20 0.36
RAB9A P51151 1/20 0.32
PRKCA P17252 1/20 0.32
PRKCD Q05655 1/20 0.32
ESR1 P03372 4/20 0.31
CNR1 P21554 1/20 0.31
GAA P10253 1/20 0.31
PKM P14618 1/20 0.31
TDP1 Q9NUW8 1/20 0.30
SLC29A1 Q99808 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17879733 0.92 LCK (0.36) LCKFYNSERPINE1RAB9AESR1
Pyrimidine SCHEMBL18788532 0.90 LCK (0.34) LCKFYNSERPINE1GAA
Pyridine SCHEMBL18788530 0.90 LCK (0.37) LCKFYNSERPINE1GAATDP1
SCHEMBL17879748 0.87 LOXL2 (0.38) LCKFYNTDP1
SCHEMBL19325456 0.87 TDP1 (0.42) TDP1
SCHEMBL20110635 0.86 LCK (0.39) LCKFYNSERPINE1RAB9AESR1
SCHEMBL17883529 0.85 LCK (0.38) LCKFYNSERPINE1ESR1TDP1
SCHEMBL17879781 0.84 CKS1B (0.37)
SCHEMBL18788531 0.84 KMT2A (0.39) GAAPKMTDP1
SCHEMBL18823040 0.84 SERPINE1 (0.34) SERPINE1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200379351-A1 PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2020-12-03 US disclosed
US-10481495-B2 Topcoat compositions containing fluorinated thermal acid generators ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-11-19 US disclosed
US-10481495-B2 Topcoat compositions containing fluorinated thermal acid generators ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-11-19 US disclosed
US-20190243246-A1 TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2019-08-08 US disclosed
US-20190243246-A1 TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2019-08-08 US disclosed
US-20190202975-A1 PROCESS FOR MAKING AN ORGANIC CHARGE TRANSPORTING FILM DOW GLOBAL TECHNOLOGIES LLC (US) 2019-07-04 US disclosed
US-10241411-B2 Topcoat compositions containing fluorinated thermal acid generators ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-03-26 US disclosed
US-10241407-B2 Thermal acid generators and photoresist pattern trimming compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-03-26 US disclosed
US-10241411-B2 Topcoat compositions containing fluorinated thermal acid generators ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-03-26 US disclosed
US-10241407-B2 Thermal acid generators and photoresist pattern trimming compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-03-26 US disclosed
US-20180118968-A1 TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2018-05-03 US disclosed
US-20180118968-A1 TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2018-05-03 US disclosed
US-9696629-B2 Photoresist pattern trimming compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-07-04 US disclosed
US-9696629-B2 Photoresist pattern trimming compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2017-07-04 US disclosed
US-20170123313-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS ROHM & HAAS ELECT MAT (US) 2017-05-04 US disclosed
US-20170123313-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS ROHM & HAAS ELECT MAT (US) 2017-05-04 US disclosed
US-20170123314-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2017-05-04 US disclosed
US-20170123314-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2017-05-04 US disclosed
US-20160187783-A1 PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2016-06-30 US disclosed
US-20160187783-A1 PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2016-06-30 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170123313-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS ADH1A, ADH1C, FPR1 LCK 2899/4885FYN 2166/4885SERPINE1 2537/4885
US-20170123314-A1 THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS ADH1A, PUF60, PARG LCK 784/4885FYN 931/4885SERPINE1 1449/4885
US-10241407-B2 Thermal acid generators and photoresist pattern trimming compositions and methods ADH1A, ADH1C, FPR1 LCK 2899/4885FYN 2166/4885SERPINE1 2537/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.