Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.52 |
| ▸ | LMNA | P02545 | 1/20 | 0.52 |
| ▸ | MAPT | P10636 | 3/20 | 0.51 |
| ▸ | NPC1 | O15118 | 2/20 | 0.51 |
| ▸ | RAB9A | P51151 | 2/20 | 0.51 |
| ▸ | POLB | P06746 | 2/20 | 0.50 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.50 |
| ▸ | PKM | P14618 | 1/20 | 0.47 |
| ▸ | ELANE | P08246 | 1/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.44 |
| ▸ | HRH3 | Q9Y5N1 | 7/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.43 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15095780 | 0.95 | TDP1 (0.49) | TDP1LMNAMAPTNPC1RAB9A | |
| SCHEMBL1952350 | 0.87 | TDP1 (0.54) | TDP1MAPTNPC1RAB9APOLB | |
| SCHEMBL13713513 | 0.85 | LMNA (0.52) | TDP1LMNAMAPTNPC1RAB9A | |
| SCHEMBL14649773 | 0.85 | CA12 (0.47) | TDP1LMNAMAPTNPC1RAB9A | |
| SCHEMBL26085043 | 0.84 | ELANE (0.54) | TDP1MAPTNPC1RAB9APOLB | |
| SCHEMBL7620007 | 0.84 | CYP3A4 (0.56) | LMNAMAPTPOLBPKMELANE | |
| SCHEMBL11133412 | 0.84 | LMNA (0.50) | TDP1LMNAMAPTNPC1RAB9A | |
| SCHEMBL4517844 | 0.84 | LMNA (0.50) | TDP1LMNAMAPTNPC1RAB9A | |
| SCHEMBL1790593 | 0.84 | KMT2A (0.56) | TDP1LMNAMAPTNPC1RAB9A | |
| SCHEMBL1833341 | 0.84 | NPC1 (0.54) | TDP1MAPTNPC1RAB9APOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11780946-B2 | Alternating copolymer, method of producing alternating copolymer, method of producing polymeric compound, and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-10 | — | — | US | disclosed |
| US-20230217718-A1 | METHOD FOR PRODUCING LIGHT-EMITTING ELEMENTS | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-07-06 | — | — | US | disclosed |
| EP-2249426-B1 | NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE BATTERY | MITSUBISHI CHEM CORP (JP) | 2019-07-10 | — | — | EP | disclosed |
| US-10301417-B2 | Polyisocyanate composition and isocyanate polymer composition | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2019-05-28 | — | — | US | disclosed |
| US-20180210338-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-07-26 | — | — | US | disclosed |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-10 | — | — | US | disclosed |
| US-20170298169-A1 | Polyisocyanate Composition and Isocyanate Polymer Composition | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2017-10-19 | — | — | US | disclosed |
| US-20170131633-A1 | CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-05-11 | — | — | US | disclosed |
| US-9405200-B2 | Resist composition and method of forming resist pattern | TOYKO OHKA KOGYO CO., LTD. (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9235120-B2 | Negative actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, resist-coated mask blanks, resist pattern forming method, and photomask | FUJIFILM CORPORATION (JP) | 2016-01-12 | — | — | US | disclosed |
| US-20130071789-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-03-21 | — | — | US | disclosed |
| US-20130022911-A1 | POLYMER, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20120308883-A1 | NONAQUEOUS ELECTROLYTIC SOLUTION AND NONAQUEOUS-ELECTROLYTE BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2012-12-06 | — | — | US | disclosed |
| US-20120219854-A1 | NONAQUEOUS ELECTROLYTIC SOLUTION AND NONAQUEOUS-ELECTROLYTE BATTERY | MITSUBISHI CHEMICAL CORPORATION (JP) | 2012-08-30 | — | — | US | disclosed |
| US-20120094235-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-04-19 | — | — | US | disclosed |
| US-20120009522-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-12 | — | — | US | disclosed |
| US-20110123871-A1 | NONAQUEOUS ELECTROLYTIC SOLUTION AND NONAQUEOUS-ELECTROLYTE BATTERY | MITSUBISHI CHEMCIAL (JP) | 2011-05-26 | — | — | US | disclosed |
| EP-2249426-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE BATTERY | Mitsubishi Chemical Corporation (JP) | 2010-11-10 | — | — | EP | disclosed |
| US-7441883-B2 | Production process of inkjet ink composition and inkjet composition | FUJIFILM CORPORATION (JP) | 2008-10-28 | — | — | US | disclosed |
| US-4342473-A | Pressure-sensitive copy systems containing phenolic ester as color-stabilizers | CHAMPION INTERNATIONAL CORPORATION (US) | 1982-08-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10301417-B2 | Polyisocyanate composition and isocyanate polymer composition | PAH, ALKBH1, ALKBH3 | TDP1 621/4885LMNA 1986/4885MAPT 1300/4885 |
| US-20170298169-A1 | Polyisocyanate Composition and Isocyanate Polymer Composition | TST, SUDS3, SCLY | TDP1 4009/4885LMNA 3419/4885MAPT 2554/4885 |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | SLC11A2, XRCC5, RAD54L | TDP1 1830/4885LMNA 1379/4885MAPT 3421/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.