SCHEMBL17878788

SCHEMBL17878788

C=C(C)C(=O)OC1(C)CCOC(=O)C1(F)F

nearest known ligand 0.38

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.30
CYP2C9 P11712 1/20 0.30
MAPT P10636 1/20 0.30
XBP1 P17861 1/20 0.30
HTT P42858 1/20 0.30
KMT2A Q03164 1/20 0.30
PAX8 Q06710 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17878790 0.85 MAPT (0.31) MAPTXBP1HTTKMT2APAX8
SCHEMBL685967 0.78 LMNA (0.33) LMNACYP2C9
SCHEMBL17878794 0.78 ALDH1A1 (0.33)
SCHEMBL17878792 0.77 MAPT (0.32) MAPTXBP1HTTKMT2APAX8
SCHEMBL1899533 0.74 TSHR (0.33)
SCHEMBL17878789 0.73 MAPT (0.37) MAPTXBP1HTTKMT2APAX8
SCHEMBL1143134 0.72 ALDH1A1 (0.32)
SCHEMBL12608901 0.71 LMNA (0.30) LMNACYP2C9
SCHEMBL217690 0.70 LMNA (0.46) LMNACYP2C9
SCHEMBL217689 0.70 LMNA (0.46) LMNACYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10331031-B2 Resin composition, resist pattern-forming method and polymer JSR CORPORATION (JP) 2019-06-25 US disclosed
US-20170115570-A1 RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER JSR CORPORATION (JP) 2017-04-27 US disclosed
US-20170115570-A1 RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER JSR CORPORATION (JP) 2017-04-27 US disclosed
US-20160185999-A1 RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER JSR CORPORATION (JP) 2016-06-30 US disclosed
US-20160185999-A1 RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER JSR CORPORATION (JP) 2016-06-30 US disclosed